Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPRC | P08575 | 8/20 | 0.77 |
| ▸ | PTPN1 | P18031 | 5/20 | 0.77 |
| ▸ | MEN1 | O00255 | 4/20 | 0.77 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.77 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.77 |
| ▸ | CES1 | P23141 | 3/20 | 0.77 |
| ▸ | MAPT | P10636 | 3/20 | 0.77 |
| ▸ | IDO1 | P14902 | 2/20 | 0.77 |
| ▸ | LMNA | P02545 | 2/20 | 0.77 |
| ▸ | BCHE | P06276 | 2/20 | 0.77 |
| ▸ | POLB | P06746 | 2/20 | 0.77 |
| ▸ | THRB | P10828 | 2/20 | 0.77 |
| ▸ | RECQL | P46063 | 2/20 | 0.77 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.77 |
| ▸ | HPGD | P15428 | 2/20 | 0.77 |
| ▸ | PTPN22 | Q9Y2R2 | 2/20 | 0.77 |
| ▸ | PKM | P14618 | 1/20 | 0.77 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.77 |
| ▸ | ACHE | P22303 | 1/20 | 0.77 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.77 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,2-Naphthoquinone SCHEMBL203171 | 0.98 | PTPRC (0.74) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL9225602 | 0.92 | PTPRC (0.83) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL29368763 | 0.92 | PTPRC (0.83) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL20212026 | 0.92 | PTPRC (0.83) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL5147399 | 0.92 | PTPRC (0.65) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL10930514 | 0.89 | PTPRC (0.61) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL173316 | 0.88 | PTPRC (1.00) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL15167712 | 0.88 | PTPRC (1.00) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL29363665 | 0.88 | PTPRC (1.00) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL30697786 | 0.86 | PTPRC (0.95) | PTPRCPTPN1MEN1KMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7248619-A | — | — | None | — | — | JP | disclosed |
| EP-2505576-B1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-24 | — | — | EP | disclosed |
| EP-2599814-B1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-02-14 | — | — | EP | disclosed |
| US-9239517-B2 | Compound, radiation-sensitive composition and resist pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-01-19 | — | — | US | disclosed |
| US-8969629-B2 | Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-03-03 | — | — | US | disclosed |
| EP-2599814-A1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-06-05 | — | — | EP | disclosed |
| US-20130122423-A1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20120282546-A1 | CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-11-08 | — | — | US | disclosed |
| EP-2505576-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-10-03 | — | — | EP | disclosed |
| JP-H07248619-A | POSITIVE TYPE PHOTO-RESIST COMPOSITION | TOPPAN PRINTING CO LTD | 1995-09-26 | — | — | JP | disclosed |
| US-4740450-A | COATING WITH PHOTOSENSITIVE LAYER CONTAINING SCRATCH IMPROVER; DRYING, MIGRATION | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1988-04-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130122423-A1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | DDB1, DNAJB11, RAD51 | PTPRC 3834/4885PTPN1 3325/4885MEN1 1983/4885 |
| US-20120282546-A1 | CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | CROCC, XRCC6, CHEK1 | PTPRC 3273/4885PTPN1 2963/4885MEN1 1009/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.