Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPRC | P08575 | 8/20 | 0.74 |
| ▸ | PTPN1 | P18031 | 5/20 | 0.74 |
| ▸ | MEN1 | O00255 | 4/20 | 0.74 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.74 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.74 |
| ▸ | CES1 | P23141 | 3/20 | 0.74 |
| ▸ | MAPT | P10636 | 3/20 | 0.74 |
| ▸ | IDO1 | P14902 | 2/20 | 0.74 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.74 |
| ▸ | LMNA | P02545 | 2/20 | 0.74 |
| ▸ | BCHE | P06276 | 2/20 | 0.74 |
| ▸ | POLB | P06746 | 2/20 | 0.74 |
| ▸ | THRB | P10828 | 2/20 | 0.74 |
| ▸ | HPGD | P15428 | 2/20 | 0.74 |
| ▸ | RECQL | P46063 | 2/20 | 0.74 |
| ▸ | PTPN22 | Q9Y2R2 | 2/20 | 0.74 |
| ▸ | PKM | P14618 | 1/20 | 0.74 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.74 |
| ▸ | ACHE | P22303 | 1/20 | 0.74 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.74 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,2-Naphthoquinone SCHEMBL9225610 | 0.98 | PTPRC (0.77) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL9225602 | 0.94 | PTPRC (0.83) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL29368763 | 0.94 | PTPRC (0.83) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL5147399 | 0.93 | PTPRC (0.65) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL10930514 | 0.91 | PTPRC (0.61) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL20212026 | 0.90 | PTPRC (0.83) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL29363665 | 0.86 | PTPRC (1.00) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL173316 | 0.86 | PTPRC (1.00) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL15167712 | 0.86 | PTPRC (1.00) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL30697786 | 0.84 | PTPRC (0.95) | PTPRCPTPN1MEN1KMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1369 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4737505-A1 | RESIN, PHOTOSENSITIVE COMPOSITIONS, CURED OBJECT, DISPLAY DEVICE, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING CURED OBJECT | Toray Industries, Inc. (JP) | 2026-05-06 | — | — | EP | claimed |
| US-20250250378-A1 | CYANONORBORNENE POLYMERS FOR OIL RESISTANT PHOTOIMAGEABLE COMPOSITIONS | PROMERUS, LLC (US) | 2025-08-07 | — | — | US | claimed |
| US-12259651-B2 | Photosensitive, inorganic ligand-capped inorganic nanocrystals | THE UNIVERSITY OF CHICAGO (US) | 2025-03-25 | — | — | US | claimed |
| WO-2025005009-A1 | RESIN, PHOTOSENSITIVE COMPOSITIONS, CURED OBJECT, DISPLAY DEVICE, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING CURED OBJECT | 東レ株式会社 | 2025-01-02 | — | — | WO | claimed |
| US-20240101761-A1 | POLYIMIDE PRECURSOR RESIN COMPOSITION AND METHOD FOR MANUFACTURING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-03-28 | — | — | US | claimed |
| CN-116710498-A | Polyimide precursor resin composition and method for producing same | 旭化成株式会社 | 2023-09-05 | — | — | CN | claimed |
| WO-2022220080-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL | 昭和電工株式会社 | 2022-10-20 | — | — | WO | claimed |
| WO-2022154020-A1 | POLYIMIDE PRECURSOR RESIN COMPOSITION AND METHOD FOR MANUFACTURING SAME | 旭化成株式会社 | 2022-07-21 | — | — | WO | claimed |
| CN-109414950-B | Security device and method for producing an image pattern for a security device | 德拉鲁国际有限公司 | 2021-06-04 | — | — | CN | claimed |
| EP-2957955-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE | SHINETSU CHEMICAL CO (JP) | 2018-06-06 | — | — | EP | claimed |
| US-4560636-A | Light-sensitive, positive-working copying material having a rough surface provided by pigments in light-sensitive layer | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-12-24 | — | — | US | claimed |
| EP-0136110-A2 | Positive photosensitive compositions useful as photoresists | MITSUBISHI KASEI CORPORATION (JP) | 1985-04-03 | — | — | EP | claimed |
| EP-0021428-B1 | LIGHT SENSITIVE POSITIVE COPYING MATERIAL WITH A MATT SURFACE | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-11-02 | — | — | EP | claimed |
| EP-0012956-B1 | PROCESS FOR THE PRODUCTION OF LITHOGRAPHIC PRINTING PLATES | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-04-13 | — | — | EP | claimed |
| EP-0010749-B1 | PHOTOSENSITIVE COMPOSITION AND REPRODUCTION MATERIAL MADE THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-12-22 | — | — | EP | claimed |
| US-4292388-A | RESIST-FORMING PHOTOSENSITIVE RESIN LAYER, ETCHING | FUJI PHOTO FILM CO., LTD. (JP) | 1981-09-29 | — | — | US | claimed |
| US-4265999-A | EXPOSURE AND DEVELOPMENT OF A 1,2-NAPHTHOQUINONE-DIAZIDE, REMOVAL OF PRECIPITATE WITH POLYVINYLPHOSPHONIC ACID | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-05-05 | — | — | US | claimed |
| US-4188215-A | Photosensitive printing plate, method of preparing same, and method of processing same | FUJI PHOTO FILM CO., LTD. (JP) | 1980-02-12 | — | — | US | claimed |
| US-4139384-A | Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate | FUJI PHOTO FILM CO., LTD. (JP) | 1979-02-13 | — | — | US | claimed |
| US-4028111-A | Light-sensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-06-07 | — | — | US | claimed |