SCHEMBL5148115

SCHEMBL5148115

O=C([O-])c1ccc[n+](Cc2ccc(C[n+]3cccc(C(=O)[O-])c3)cc2)c1

nearest known ligand 0.59

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.59
NPSR1 Q6W5P4 1/20 0.59
USP2 O75604 1/20 0.53
ALDH1A1 P00352 1/20 0.50
ACHE P22303 3/20 0.44
LMNA P02545 2/20 0.44
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
CYP2D6 P10635 1/20 0.41
BCHE P06276 1/20 0.41
CA2 P00918 3/20 0.41
CA4 P22748 1/20 0.41
CA1 P00915 2/20 0.40
ATM Q13315 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL124993 0.93 NPSR1 (0.69) L3MBTL1NPSR1USP2ALDH1A1ACHE
SCHEMBL31124466 0.93 NPSR1 (0.69) L3MBTL1NPSR1USP2ALDH1A1ACHE
SCHEMBL11397361 0.92 L3MBTL1 (0.52) L3MBTL1NPSR1USP2ALDH1A1ACHE
SCHEMBL124204 0.92 NPSR1 (0.68) L3MBTL1NPSR1USP2ALDH1A1ACHE
SCHEMBL124202 0.92 NPSR1 (0.68) L3MBTL1NPSR1USP2ALDH1A1ACHE
Hydrochloric Acid SCHEMBL29401281 0.90 NPSR1 (0.66) L3MBTL1NPSR1USP2ALDH1A1ACHE
SCHEMBL13934018 0.82 NPSR1 (0.84) L3MBTL1NPSR1ALDH1A1MEN1KMT2A
Bromide SCHEMBL5148116 0.79 L3MBTL1 (0.60) L3MBTL1NPSR1ALDH1A1ACHELMNA
Hydrochloric Acid SCHEMBL5150273 0.79 NPSR1 (0.60) L3MBTL1NPSR1ALDH1A1ACHELMNA
Fluoride Ion SCHEMBL5146795 0.79 L3MBTL1 (0.60) L3MBTL1NPSR1ALDH1A1ACHELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1870495-A1 Aqueous alkaline, cyanide-free, bath for the galvanic deposition of Zinc and Zinc alloy layers ATOTECH DEUTSCHLAND GMBH (DE) 2007-12-26 EP disclosed
US-6652728-B1 Containing n,n'-bis(3-(dialkylamino)alkyl)urea derivatives; uniform thickness; high gloss; reduced blistering ATOTECH DEUTSCHLAND GMBH (DE) 2003-11-25 US disclosed
EP-1114206-B1 CYANIDE-FREE AQUEOUS ALKALINE BATH USED FOR THE GALVANIC APPLICATION OF ZINC OR ZINC-ALLOY COATINGS ATOTECH DEUTSCHLAND GMBH (DE) 2003-02-26 EP disclosed
WO-2000014305-A9 CYANIDE-FREE AQUEOUS ALKALINE BATH USED FOR THE GALVANIC APPLICATION OF ZINC OR ZINC-ALLOY COATINGS ATOTECH DEUTSCHLAND GMBH (DE) 2000-08-24 WO disclosed