SCHEMBL51509

SCHEMBL51509

COc1ccc(C(=O)c2ccc(OC)cc2)cc1

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXFP1 Q9HBX9 2/20 0.79
KMT2A Q03164 2/20 0.79
MAPT P10636 2/20 0.79
MEN1 O00255 1/20 0.79
LMNA P02545 1/20 0.79
MAPK1 P28482 1/20 0.79
RAB9A P51151 1/20 0.79
NPSR1 Q6W5P4 1/20 0.79
HPGD P15428 1/20 0.79
CES2 O00748 2/20 0.73
CES1 P23141 2/20 0.73
ALDH1A1 P00352 1/20 0.70
GAA P10253 1/20 0.70
CA1 P00915 5/20 0.70
CA2 P00918 5/20 0.70
TUBB4A P04350 1/20 0.68
TUBB P07437 1/20 0.68
TUBA3C P0DPH7 1/20 0.68
TUBA1B P68363 1/20 0.68
TUBA4A P68366 1/20 0.68

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9418310 1.00 RXFP1 (0.79) RXFP1KMT2AMAPTMEN1LMNA
Ethyne SCHEMBL8195983 0.95 RXFP1 (0.73) RXFP1KMT2AMAPTMEN1LMNA
SCHEMBL10494485 0.93 PARP10 (0.70) RXFP1KMT2AMAPTMEN1LMNA
SCHEMBL14407949 0.93 PARP10 (0.70) RXFP1KMT2AMAPTMEN1LMNA
SCHEMBL17469590 0.93 PARP10 (0.70) RXFP1KMT2AMAPTMEN1LMNA
SCHEMBL24538828 0.93 PARP10 (0.70) RXFP1KMT2AMAPTMEN1LMNA
SCHEMBL12362759 0.93 TUBB4A (0.72) RXFP1KMT2AMAPTMEN1LMNA
SCHEMBL19008826 0.93 PARP10 (0.70) RXFP1KMT2AMAPTMEN1LMNA
SCHEMBL21246920 0.93 RXFP1 (0.70) RXFP1KMT2AMAPTMEN1LMNA
SCHEMBL27399130 0.93 PARP10 (0.70) RXFP1KMT2AMAPTMEN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4729 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4615818-B1 PROCESS FOR THE PREPARATION OF 2-(METH)ACRYLOYLOXY BENZOIC ACID ESTERS USING A CATALYST SYSTEM EVONIK OPERATIONS GMBH (DE) 2026-02-11 EP claimed
US-20260001952-A1 ANTI-TREM2 AGONIST ANTIBODIES AND ANTIGEN-BINDING FRAGMENTS THEREOF THAT CAN INCREASE LEVELS OF SOLUBLE TREM2 IN SERUM AND BRAIN TISSUE MABWELL THERAPEUTICS INC (US) 2026-01-01 US claimed
EP-4615818-A1 PROCESS FOR THE PREPARATION OF 2-(METH)ACRYLOYLOXY BENZOIC ACID ESTERS USING A CATALYST SYSTEM Evonik Operations GmbH (DE) 2025-09-17 EP claimed
EP-4615819-A1 PROCESS FOR THE PREPARATION OF 2-(METH)ACRYLOYLOXY BENZOIC ACID ESTERS Evonik Operations GmbH (DE) 2025-09-17 EP claimed
US-20250282929-A1 UNSATURATED ESTERS CONTAINING AN ADDITIVE FOR REDUCING AND STABILIZING THE YELLOWNESS INDEX RÖHM GMBH (DE) 2025-09-11 US claimed
US-20250206986-A1 ADHESIVE SHEET AND MANUFACTURING METHOD THEREFOR LINTEC CORPORATION (JP) 2025-06-26 US claimed
WO-2025108750-A1 PROCESS FOR THE PREPARATION OF 2-(METH)ACRYLOYLOXY BENZOIC ACID ESTERS USING A CATALYST SYSTEM EVONIK OPERATIONS GMBH (DE) 2025-05-30 WO claimed
CN-119978921-A Coating composition for pavement marking and preparation method thereof 兄弟路标(四川)新材料有限公司 2025-05-13 CN claimed
CN-119371356-A Nuciferine derivative, and preparation method and application thereof 云南中医药大学 2025-01-28 CN claimed
CN-118050766-B Preparation method of organic glass solid dosimeter 深圳大学 2024-10-25 CN claimed
US-4683250-A Room-temperature-curable silicon-modified polyether composition TORAY SILICONE CO., LTD. (JP) 1987-07-28 US claimed
EP-0228087-A2 Room-temperature curable silicone-modified polyether composition Toray Silicone Company Limited (JP) 1987-07-08 EP claimed
US-4591608-A Ultraviolet-curable organopolysiloxane composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 1986-05-27 US claimed
US-4517318-A BENZOPHENONE AND TRANSITION METALCOMPOUNT ACCELERATOR Sekisu Kagaku Kogyo Kabushiki Kaisha (JP) 1985-05-14 US claimed
EP-0043480-B1 PROCESS FOR FORMING METALLIC IMAGES Hitachi, Ltd. (JP) 1985-04-03 EP claimed
US-4495315-A BENZOPHENONE-TYPE COMPOUNDS AS DEGRADING AGENT- TRANSITION METAL ACCELERATORS SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1985-01-22 US claimed
US-4347304-A PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING HITACHI, LTD. (JP) 1982-08-31 US claimed
EP-0043480-A2 Process for forming metallic images Hitachi, Ltd. (JP) 1982-01-13 EP claimed
US-4251622-A CONTAINING A DYE, AN ARYL KETONE SENSITIZER, AND AN N-SUBSTITUTED POLYAMIDE OR A VINYL ACETATE POLYMER OF HIGH MOLECULAR WEIGHT NIPPON PAINT CO., LTD. (JP) 1981-02-17 US claimed
US-4144153-A PHOTODEGRADABLE TAKIRON CO., LTD. (JP) 1979-03-13 US claimed