Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SOS1 | Q07889 | 1/20 | 0.45 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | CA12 | O43570 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | CA7 | P43166 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.41 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.41 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.40 |
| ▸ | XDH | P47989 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5154168 | 0.93 | LCK (0.44) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL2538919 | 0.90 | KMT2A (0.44) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL30107294 | 0.90 | NOTUM (0.45) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL18420521 | 0.90 | NOTUM (0.45) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL155216 | 0.90 | NOTUM (0.45) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL31385726 | 0.90 | NOTUM (0.45) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL23051540 | 0.87 | SOS1 (0.50) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL168324 | 0.86 | CA1 (0.50) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL168426 | 0.86 | CA1 (0.50) | SOS1NOTUMMAPTCA12CA1 | |
| SCHEMBL20036871 | 0.86 | KMT2A (0.44) | SOS1NOTUMMAPTCA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116803970-A | 6,6' -disubstituted-3, 3', 4' -biphenyl tetracarboxylic acid and dianhydride thereof and preparation method thereof | 中国石油化工股份有限公司 | 2023-09-26 | — | — | CN | disclosed |
| EP-1013650-B1 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | HITACHI CHEM DUPONT MICROSYS (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-6600053-B2 | Useful for producing polyimide precursors or polyimides having low thermal expansion and low residual stress | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2003-07-29 | — | — | US | disclosed |
| US-20020037991-A1 | Photosensitive resin composition | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2002-03-28 | — | — | US | disclosed |
| US-6329494-B1 | HIGH-SPEED DEVELOPABILITY, HIGH RESOLUTION AND GOOD DIMENSIONAL ACCURACY TO SUIT THEM TO THE PRODUCTION OF INTERLAYER INSULATING FILMS OR SURFACE-PROTECTING FILMS IN SEMICONDUCTOR DEVICES | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2001-12-11 | — | — | US | disclosed |
| EP-1013650-A2 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-06-28 | — | — | EP | disclosed |