Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.62 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.62 |
| ▸ | HPGD | P15428 | 4/20 | 0.62 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.62 |
| ▸ | TSHR | P16473 | 1/20 | 0.57 |
| ▸ | OGG1 | O15527 | 1/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.49 |
| ▸ | MEN1 | O00255 | 3/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | HTT | P42858 | 2/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | DAPK1 | P53355 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5697619 | 0.91 | DDB1 (0.49) | ALDH1A1KDM4EHPGDTDP1TSHR | |
| SCHEMBL28591165 | 0.87 | ALDH1A1 (0.47) | ALDH1A1KDM4EHPGDTDP1TSHR | |
| Diphenylsulfane SCHEMBL27967515 | 0.87 | ALDH1A1 (0.51) | ALDH1A1KDM4EHPGDTDP1TSHR | |
| SCHEMBL22656552 | 0.85 | POLB (0.50) | ALDH1A1KDM4EHPGDTSHRHSD17B10 | |
| SCHEMBL22610037 | 0.85 | LMNA (0.47) | ALDH1A1KDM4EHPGDTDP1TSHR | |
| SCHEMBL2758525 | 0.85 | HPGD (0.46) | ALDH1A1KDM4EHPGDTDP1TSHR | |
| SCHEMBL7277563 | 0.84 | CNR2 (0.54) | ALDH1A1KDM4EHPGDTDP1HSD17B10 | |
| SCHEMBL2758527 | 0.84 | DDB1 (0.45) | ALDH1A1KDM4EHPGDTDP1TSHR | |
| SCHEMBL1368627 | 0.83 | RXFP1 (0.64) | ALDH1A1HPGDTSHRL3MBTL1KMT2A | |
| Diphenylsulfane SCHEMBL28669697 | 0.83 | ALDH1A1 (0.47) | ALDH1A1KDM4EHPGDTDP1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1757980-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1757980-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20070042292-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-02-22 | — | — | US | disclosed |
| US-20070042292-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-02-22 | — | — | US | disclosed |
| US-20070042292-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-02-22 | — | — | US | disclosed |
| EP-1441256-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-0789278-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-05-04 | — | — | EP | disclosed |
| EP-1441256-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2004-07-28 | — | — | EP | disclosed |
| US-6727032-B1 | USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. | JSR CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| US-6692887-B1 | COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY | JSR CORPORATION (JP) | 2004-02-17 | — | — | US | disclosed |
| US-6111143-A | BY ONE-STEP REACTION BETWEEN SULFOXIDE COMPOUND AND AROMATIC COMPOUND IN PRESENCE OF PERFLUOROALKANESULFONIC ANHYDRIDE; USE AS POLYMERIZATION PHOTOINITIATOR, OR PHOTOACID GENERATOR LEAVING THE PROTECTION GROUPS OF ORGANIC COMPOUNDS | KOREA KUMBO PETROCHEMICAL CO., LTD. (KR) | 2000-08-29 | — | — | US | disclosed |
| EP-0972761-A1 | Sulfonium salt and its manufacturing method | Korea Kumho Petrochemical Co. Ltd. (KR) | 2000-01-19 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |