Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 3/20 | 0.63 |
| ▸ | RAB9A | P51151 | 3/20 | 0.63 |
| ▸ | NPC1 | O15118 | 2/20 | 0.63 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.62 |
| ▸ | MEN1 | O00255 | 3/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.59 |
| ▸ | NOX1 | Q9Y5S8 | 2/20 | 0.59 |
| ▸ | CNR2 | P34972 | 2/20 | 0.58 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.56 |
| ▸ | ESRRG | P62508 | 1/20 | 0.54 |
| ▸ | MAOB | P27338 | 1/20 | 0.52 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.51 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.51 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.51 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzophenone SCHEMBL10489584 | 1.00 | HPGD (0.63) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| Benzophenone SCHEMBL10783648 | 0.95 | HPGD (0.58) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| SCHEMBL9148695 | 0.93 | HPGD (0.77) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| SCHEMBL29057750 | 0.93 | HPGD (0.56) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| SCHEMBL29052656 | 0.93 | RAB9A (0.56) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| SCHEMBL9593851 | 0.93 | RAB9A (0.56) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| SCHEMBL61950 | 0.92 | ALDH1A1 (0.58) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| Hydrogen Sulfide SCHEMBL6567203 | 0.90 | MAPT (0.56) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| SCHEMBL6569210 | 0.90 | MAPT (0.56) | HPGDRAB9ANPC1ALDH1A1MEN1 | |
| SCHEMBL6567199 | 0.90 | MAPT (0.56) | HPGDRAB9ANPC1ALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5076 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries I, LLC | 2026-02-05 | — | — | US | claimed |
| CN-116023895-B | UV moisture dual-curing sealant and preparation method thereof | 成都拓利科技股份有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119019442-A | Alkyl aluminum compound, rare earth catalyst composition prepared from alkyl aluminum compound and application of alkyl aluminum compound in preparation of double-end functionalized rubber | 中国科学院大连化学物理研究所 | 2024-11-26 | — | — | CN | claimed |
| CN-118222205-A | Adhesive sheet for display and display panel comprising same | 利诺士尖端材料有限公司 | 2024-06-21 | — | — | CN | claimed |
| CN-117965087-A | Anti-dazzle coating, anti-dazzle hardening film and preparation method | 宁波惠之星新材料科技股份有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-116023895-A | UV moisture dual-curing sealant and preparation method thereof | 成都拓利科技股份有限公司 | 2023-04-28 | — | — | CN | claimed |
| US-11491711-B2 | Method of making 3D printed objects using two distinct light sources | PHOTOCENTRIC LIMITED (GB) | 2022-11-08 | — | — | US | claimed |
| US-11421049-B2 | Photopolymerization synergist | Piedmont Chemical Industries, LLC (US) | 2022-08-23 | — | — | US | claimed |
| CN-109988512-B | Ultraviolet curable optical adhesive, method for preparing the same and composition for the same | 泰柏斯科技有限公司 | 2022-07-26 | — | — | CN | claimed |
| WO-2021096751-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries, LLC (US) | 2021-05-20 | — | — | WO | claimed |
| US-5202221-A | Photocrosslinkable copolymer having maleimido side chain, cyanine dye sensitizer | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-13 | — | — | US | claimed |
| US-5110709-A | Photoresists of excellent image resolution | FUJI PHOTO FILM CO., LTD. (JP) | 1992-05-05 | — | — | US | claimed |
| US-5100767-A | Epoxy resins | TAMURA KAKEN CO., LTD. (JP) | 1992-03-31 | — | — | US | claimed |
| US-5002853-A | Polymeric Sulfonyloxy-Amides and Iides | FUJI PHOTO FILM CO., LTD. (JP) | 1991-03-26 | — | — | US | claimed |
| US-4996132-A | Heat-resistant photosensitive resin composition | TOYKO OHKA KOGYO CO. LTD. (JP) | 1991-02-26 | — | — | US | claimed |
| US-4975471-A | Photo-curable epoxy resin type composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-12-04 | — | — | US | claimed |
| EP-0363198-A2 | Positive working photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1990-04-11 | — | — | EP | claimed |
| EP-0280295-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-08-31 | — | — | EP | claimed |
| US-4258121-A | SULFONYLOXY N-SUBSTITUTED IMIDES AS PHOTOINITIATORS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-24 | — | — | US | claimed |
| US-4148658-A | BENZOYLMETHYLENE-BENSOTHIAZOLYIDEND-THIAZOLIDONE COMPOUND, AMINE, AND AMINOARYLCARBONYL COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1979-04-10 | — | — | US | claimed |