SCHEMBL5162448

SCHEMBL5162448

CCCC(=O)OO[Si](C)(C)C

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.50
CES2 O00748 3/20 0.38
CES1 P23141 3/20 0.38
FFAR3 O14843 3/20 0.36
HDAC3 O15379 3/20 0.36
HDAC1 Q13547 3/20 0.36
HDAC2 Q92769 3/20 0.36
HDAC8 Q9BY41 3/20 0.36
CTSD P07339 1/20 0.36
DGKA P23743 1/20 0.35
CYP1A2 P05177 1/20 0.35
TSHR P16473 2/20 0.35
LMNA P02545 2/20 0.33
HTR2C P28335 1/20 0.32
PAM P19021 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8432835 0.85 DGKA (0.55) ALDH1A1CES2CES1DGKATSHR
SCHEMBL297885 0.79 ALDH1A1 (0.67) ALDH1A1CES2CES1FFAR3HDAC3
SCHEMBL31386976 0.79 ALDH1A1 (0.43) ALDH1A1CES2CES1FFAR3HDAC3
SCHEMBL27387114 0.77 TSHR (0.56) ALDH1A1HDAC3HDAC1HDAC2HDAC8
SCHEMBL30719571 0.75
SCHEMBL22775172 0.75 ALDH1A1 (0.55) ALDH1A1CES2CES1DGKATSHR
SCHEMBL466165 0.75 ALDH1A1 (0.55) ALDH1A1CES2CES1FFAR3HDAC3
SCHEMBL2199879 0.75
SCHEMBL13666970 0.75 ALDH1A1 (0.55) ALDH1A1CES2CES1FFAR3HDAC3
SCHEMBL27544032 0.74 ALDH1A1 (0.33) ALDH1A1CES2CES1FFAR3HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1342738-B1 Photocurable composition, process for producing photocurable resin, and crosslinked product DAINIPPON INK & CHEMICALS (JP) 2007-03-07 EP disclosed
US-6924324-B2 Photocurable composition, process for producing photocurable resin, and crosslinked product DAINIPPON INK AND CHEMICALS, INC. (JP) 2005-08-02 US disclosed
US-20030225180-A1 Photocurable composition, process for producing photocurable resin, and crosslinked product DAINIPPON INK AND CHEMICALS, INC. (JP) 2003-12-04 US disclosed
EP-1342738-A1 Photocurable composition, process for producing photocurable resin, and crosslinked product DAINIPPON INK AND CHEMICALS, INC. (JP) 2003-09-10 EP disclosed