SCHEMBL5162723

SCHEMBL5162723

CCO[Si](CCCN(OCCOCCOC)C(N)=O)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1482092 1.00
SCHEMBL436296 0.87
SCHEMBL15561288 0.83 ALDH1A1 (0.35)
SCHEMBL16986427 0.83 CA2 (0.31)
SCHEMBL21110864 0.82
SCHEMBL27093071 0.76 BLM (0.30)
SCHEMBL3871697 0.76 BLM (0.30)
SCHEMBL28484647 0.76 BLM (0.30)
SCHEMBL21111251 0.74
SCHEMBL21111298 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1349900-B1 METHODS AND COMPOSITIONS FOR INK JET PRINTING OF PRESSURE SENSITIVE ADHESIVE PATTERNS 3M INNOVATIVE PROPERTIES CO (US) 2007-02-14 EP disclosed
US-6883908-B2 Methods and compositions for ink jet printing of pressure sensitive adhesive patterns or films on a wide range of substrates 3M INNOVATIVE PROPERTIES COMPANY (US) 2005-04-26 US disclosed
EP-1349900-A2 METHODS AND COMPOSITIONS FOR INK JET PRINTING OF PRESSURE SENSITIVE ADHESIVE PATTERNS 3M Innovative Properties Company (US) 2003-10-08 EP disclosed
US-20020128340-A1 Methods and compositions for ink jet printing of pressure sensitive adhesive patterns or films on a wide range of substrates 3M INNOVATIVE PROPERTIES COMPANY 2002-09-12 US disclosed
WO-2002066571-A2 METHODS AND COMPOSITIONS FOR INK JET PRINTING OF PRESSURE SENSITIVE ADHESIVE PATTERNS 3M INNOVATIVE PROPERTIES COMPANY (US) 2002-08-29 WO disclosed