Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 13/20 | 0.57 |
| ▸ | DNM1 | Q05193 | 3/20 | 0.55 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.50 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | THRB | P10828 | 1/20 | 0.50 |
| ▸ | MGLL | Q99685 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9174252 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL11338420 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL8750284 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL15993932 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL11336824 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL4251988 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL25341537 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL9852686 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL8957984 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR | |
| SCHEMBL10683264 | 1.00 | KCNH2 (0.57) | KCNH2DNM1PLA2G1BPLA2G2ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 983 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115991633-B | Method for preparing methanol and ethylene glycol and co-producing formic acid by photocatalysis of polyalcohol | 中国科学院大连化学物理研究所 | 2024-06-25 | — | — | CN | claimed |
| CN-115991633-A | Method for preparing methanol and ethylene glycol and co-producing formic acid by photocatalysis of polyalcohol | 中国科学院大连化学物理研究所 | 2023-04-21 | — | — | CN | claimed |
| US-11021499-B2 | Bis(6-methyl-3-sulphophenyl)(2-methylphenyl)phosphine, ammonium salt thereof, and method for producing same | KURARAY CO., LTD. (JP) | 2021-06-01 | — | — | US | claimed |
| US-10696701-B2 | Bis(6-methyl-3-sulphophenyl)phenylphosphine, ammonium salt thereof, and method for producing same | KURARAY CO., LTD. (JP) | 2020-06-30 | — | — | US | claimed |
| US-20190071460-A1 | BIS(6-METHYL-3-SULPHOPHENYL)(2-METHYLPHENYL)PHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME | HONDA ERIKO (JP) | 2019-03-07 | — | — | US | claimed |
| EP-2980093-B1 | BIS(6-METHYL-3-SULPHOPHENYL)(2-METHYLPHENYL)PHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME | KURARAY CO (JP) | 2019-01-09 | — | — | EP | claimed |
| US-20180141967-A1 | BIS(6-METHYL-3-SULPHOPHENYL)PHENYLPHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME | KURARAY CO., LTD. (JP) | 2018-05-24 | — | — | US | claimed |
| EP-2980092-B1 | BIS(6-METHYL-3-SULPHOPHENYL)PHENYLPHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME | KURARAY CO (JP) | 2017-10-04 | — | — | EP | claimed |
| US-20160052948-A1 | BIS(6-METHYL-3-SULPHOPHENYL)(2-METHYLPHENYL)PHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME | KURARAY CO., LTD. (JP) | 2016-02-25 | — | — | US | claimed |
| US-20160052947-A1 | BIS(6-METHYL-3-SULPHOPHENYL)PHENYLPHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME | KURARAY CO., LTD. (JP) | 2016-02-25 | — | — | US | claimed |
| EP-2980092-A1 | BIS(6-METHYL-3-SULPHOPHENYL)PHENYLPHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME | Kuraray Co., Ltd. (JP) | 2016-02-03 | — | — | EP | claimed |
| EP-2980093-A1 | BIS(6-METHYL-3-SULPHOPHENYL)(2-METHYLPHENYL)PHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME | Kuraray Co., Ltd. (JP) | 2016-02-03 | — | — | EP | claimed |
| US-20260147276-A1 | NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-05-28 | — | — | US | disclosed |
| US-12624016-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-05-12 | — | — | US | disclosed |
| US-12619145-B2 | Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-05-05 | — | — | US | disclosed |
| US-20260118758-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| US-4801426-A | INJECTING NITROGEN GAS INTO LIQUID AMINE | ETHYL CORPORATION (US) | 1989-01-31 | — | — | US | disclosed |
| EP-0292564-A1 | PROCESS FOR PREPARING ALKOXYALKYL-SUBSTITUTED PHENOLS | IDEMITSU PETROCHEMICAL CO. LTD. (JP) | 1988-11-30 | — | — | EP | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12619145-B2 | Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern | MSR1, H1-4, ARG1 | KCNH2 1134/4885DNM1 2294/4885PLA2G1B 3401/4885 |
| US-20260147276-A1 | NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RFC1, RFC2, RFC4 | KCNH2 2560/4885DNM1 1075/4885PLA2G1B 2549/4885 |
| US-20260118758-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, MSR1, CBR1 | KCNH2 832/4885DNM1 1366/4885PLA2G1B 3494/4885 |
| US-12624016-B2 | Salt, acid generator, resist composition and method for producing resist pattern | CLIC4, SCO2, H1-0 | KCNH2 155/4885DNM1 1645/4885PLA2G1B 2970/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.