SCHEMBL5165213

SCHEMBL5165213

C=C(CC1CC(C)CCC1C(C)C)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 3/20 0.46
TRPM8 Q7Z2W7 4/20 0.44
TRPA1 O75762 2/20 0.44
KCNA5 P22460 1/20 0.36
TRPV1 Q8NER1 3/20 0.36
CYP19A1 P11511 2/20 0.36
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Formaldehyde SCHEMBL31298519 0.83 EPHX1 (0.49) EPHX1TRPM8TRPA1KCNA5TRPV1
SCHEMBL11291061 0.83 EPHX1 (0.49) EPHX1TRPM8TRPA1KCNA5TRPV1
SCHEMBL9951572 0.83 EPHX1 (0.51) EPHX1TRPM8TRPA1KCNA5TRPV1
SCHEMBL457824 0.83 EPHX1 (0.51) EPHX1TRPM8TRPA1KCNA5TRPV1
Acetic Acid SCHEMBL30541669 0.80 EPHX1 (0.49) EPHX1TRPM8TRPA1KCNA5TRPV1
SCHEMBL9951688 0.80 EPHX1 (0.51) EPHX1TRPM8TRPA1TRPV1CYP19A1
SCHEMBL28350744 0.80 EPHX1 (0.51) EPHX1TRPM8TRPA1TRPV1CYP19A1
SCHEMBL9951381 0.80 EPHX1 (0.51) EPHX1TRPM8TRPA1TRPV1CYP19A1
SCHEMBL10028627 0.78 EPHX1 (0.59) EPHX1TRPM8TRPA1TRPV1CYP19A1
SCHEMBL3855216 0.77 EPHX1 (0.50) EPHX1TRPM8TRPA1TRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3642284-B1 CURABLE ORGANOPOLYSILOXANE COMPOSITIONS WACKER CHEMIE AG (DE) 2022-06-01 EP disclosed
EP-3642284-A1 CURABLE ORGANOPOLYSILOXANE COMPOSITIONS Wacker Chemie AG (DE) 2020-04-29 EP disclosed
WO-2019052660-A1 CURABLE ORGANOPOLYSILOXANE COMPOSITIONS WACKER CHEMIE AG (DE) 2019-03-21 WO disclosed
CN-103592717-B Light guide plate, light emitting unit and liquid crystal display element having the same CHI MEI CORP. (CN) 2015-10-28 CN disclosed
EP-1112995-B1 ALICYCLIC COMPOUNDS AND CURABLE RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2007-04-11 EP disclosed
US-6365771-B1 CURABLE VINYL ETHER OR METHACRYLATE DERIVATIVES OF 4,7 METHANOINDENE OR INDANE; PHOTORESISTS, OPTICS, AND COATINGS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2002-04-02 US disclosed
US-6352813-B2 ACRYLIC POLYMER NEC CORPORATION (JP) 2002-03-05 US disclosed
US-20010021482-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PATTERNING METHOD USING THE SAME KAICHIRO NAKANO 2001-09-13 US disclosed
US-6280897-B1 GENERATION OF ACID WITH ACTINIC RADIATION KABUSHIKI KAISHA TOSHIBA (JP) 2001-08-28 US disclosed
EP-1112995-A1 ALICYCLIC COMPOUNDS AND CURABLE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2001-07-04 EP disclosed
US-6228552-B1 ALKALI SOLUBLE RESIN KABUSHIKI KAISHA TOSHIBA (JP) 2001-05-08 US disclosed
US-6045968-A COMPRISING AN ACID-DECOMPOSABLE NOVOLAK RESIN, AN ALKALI-SOLUBLE RESIN AND A PHOTO-ACID GENERATING AGENT; HIGH ALKALI SOLUBILITY, HIGH RESOLUTION, AND HIGH REPRODUCIBILITY KABUSHIKI KAISHA TOSHIBA (JP) 2000-04-04 US disclosed
US-5837419-A ACID DECOMPOSABLE RESIN, PHOTO-ACID GENERATING AGENT AND NAPHTHOL NOVOLAK KABUSHIKI KAISHA TOSHIBA (JP) 1998-11-17 US disclosed
US-4680359-A CYCLOALIPHATIC METHACRYLATE INTERPOLYMER ROHM GMBH (DE) 1987-07-14 US disclosed