Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 2/20 | 0.48 |
| ▸ | CES2 | O00748 | 1/20 | 0.48 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.48 |
| ▸ | LOXL2 | Q9Y4K0 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | FNTA | P49354 | 1/20 | 0.40 |
| ▸ | FNTB | P49356 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | CTBP2 | P56545 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27781879 | 0.87 | CES1 (0.41) | CES1CES2AKR1B1LOXL2TSHR | |
| SCHEMBL3473792 | 0.78 | CES1 (0.46) | CES1CES2AKR1B1LOXL2TSHR | |
| SCHEMBL22448557 | 0.78 | CES2 (0.32) | CES1CES2AKR1B1KMT2AMEN1 | |
| SCHEMBL28310293 | 0.77 | CES1 (0.50) | CES1CES2AKR1B1TSHRKMT2A | |
| SCHEMBL516676 | 0.76 | CES1 (0.44) | CES1CES2AKR1B1LOXL2TSHR | |
| SCHEMBL140663 | 0.76 | CES1 (0.44) | CES1CES2AKR1B1LOXL2TSHR | |
| Ammonia Solution, Strong SCHEMBL27571740 | 0.75 | CES1 (0.48) | CES1CES2AKR1B1TSHRKMT2A | |
| SCHEMBL2146350 | 0.75 | CES2 (0.43) | CES1CES2AKR1B1MAOB | |
| SCHEMBL29720911 | 0.73 | CYP3A4 (0.59) | CES1CES2AKR1B1TSHRKMT2A | |
| SCHEMBL9631890 | 0.73 | MAOB (0.50) | CES1CES2AKR1B1TSHRKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023032492-A1 | REACTION ACCELERATOR | ＥＮＥＯＳ株式会社 | 2023-03-09 | — | — | WO | disclosed |
| CN-104363756-B | Agricultural plant-protecting agent containing dipeptide derivative as active ingredient | 农村振兴厅 | 2017-10-31 | — | — | CN | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2481583-B1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, and relief printing plate and process for making the same | FUJIFILM CORP (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-8541534-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20130133537-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND FLEXOGRAPHIC PRINTING PLATE AND PROCESS FOR MAKING SAME | FUJIFILM CORPORATION (JP) | 2013-05-30 | — | — | US | disclosed |
| EP-2565046-A2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate | Fujifilm Corporation (JP) | 2013-03-06 | — | — | EP | disclosed |
| US-20120024224-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING THE SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING THE SAME | FUJIFILM CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20110076454-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING STARTING PLATE FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING SAME | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| EP-2301750-A1 | Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same | Fujifilm Corporation (JP) | 2011-03-30 | — | — | EP | disclosed |
| WO-2010090345-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD FOR PRODUCING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | WO | disclosed |
| EP-0658162-A1 | CARBAPENEM DERIVATIVES AND PROCESSES FOR PREPARING THE SAME | DONG-A PHARM. CO., LTD. (KR) | 1995-06-21 | — | — | EP | disclosed |
| US-5147750-A | Amino group containing polymers; narrow electrostatic charge distribution | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 1992-09-15 | — | — | US | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| CN-87106452-A | New cephalosporanic olefinic compound and preparation method thereof | — | 1988-05-04 | — | — | CN | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |
| EP-0111326-A1 | Process for the manufacture of chiral azetidinones | F. HOFFMANN-LA ROCHE & CO. Aktiengesellschaft (CH) | 1984-06-20 | — | — | EP | disclosed |