⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15457506 | 0.97 | ALDH1A1 (0.40) | — | |
| SCHEMBL3966810 | 0.97 | ALDH1A1 (0.40) | — | |
| SCHEMBL516428 | 0.92 | — | — | |
| SCHEMBL15457509 | 0.91 | ALDH1A1 (0.37) | — | |
| SCHEMBL7776734 | 0.84 | ALDH1A1 (0.41) | — | |
| SCHEMBL31671011 | 0.78 | ALDH1A1 (0.41) | — | |
| SCHEMBL516345 | 0.78 | ALDH1A1 (0.39) | — | |
| SCHEMBL17806022 | 0.77 | — | — | |
| SCHEMBL9804453 | 0.77 | ALDH1A1 (0.40) | — | |
| SCHEMBL10870183 | 0.77 | ALDH1A1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10236464-B2 | Organic light emitting diode | SAMSUNG DISPLAY CO., LTD. (KR) | 2019-03-19 | — | — | US | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2481583-B1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, and relief printing plate and process for making the same | FUJIFILM CORP (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-8541534-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20130133537-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND FLEXOGRAPHIC PRINTING PLATE AND PROCESS FOR MAKING SAME | FUJIFILM CORPORATION (JP) | 2013-05-30 | — | — | US | disclosed |
| EP-2565046-A2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate | Fujifilm Corporation (JP) | 2013-03-06 | — | — | EP | disclosed |
| US-20130047878-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |
| US-4215114-A | Analgesic N-[2-(furyl-methylamino and 2-thienylmethylamino)cycloaliphatic]be | THE UPJOHN COMPANY (US) | 1980-07-29 | — | — | US | disclosed |
| US-4197308-A | Analgesic N-(2-heterocyclic-amino cycloaliphatic) benzamides | THE UPJOHN COMPANY (US) | 1980-04-08 | — | — | US | disclosed |
| US-4192885-A | Analgesic N-{2-[N'-(2-furylmethyl and 2-thienyl-methyl)-N'-alkylamino]cycloaliphatic}cyanobenzamides | THE UPJOHN COMPANY (US) | 1980-03-11 | — | — | US | disclosed |
| US-4179501-A | Analgesic N-(2-aminocycloaliphatic)azidobenzamides | THE UPJOHN COMPANY (US) | 1979-12-18 | — | — | US | disclosed |
| US-4153717-A | 260/332.2 R | THE UPJOHN COMPANY (US) | 1979-05-08 | — | — | US | disclosed |
| US-4152459-A | Analgesic N-2-(aminocycloaliphatic)-hydroxy, alkoxy and (allylic)alkenyloxy-benzamides | THE UPJOHN COMPANY (US) | 1979-05-01 | — | — | US | disclosed |
| US-4148914-A | Analgesic N-(2-aminocyclo aliphatic)cyanobenzamides | THE UPJOHN COMPANY (US) | 1979-04-10 | — | — | US | disclosed |
| US-4145435-A | 2-AMINOCYCLOALIPHATIC AMIDE COMPOUNDS | THE UPJOHN COMPANY (US) | 1979-03-20 | — | — | US | disclosed |
| US-4098904-A | ANALGESIC N-(2-AMINOCYCLOALIPHATIC)BENZAMIDES | THE UPJOHN COMPANY (US) | 1978-07-04 | — | — | US | disclosed |