⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2883576 | 0.71 | — | — | |
| SCHEMBL8195976 | 0.71 | — | — | |
| SCHEMBL515066 | 0.71 | — | — | |
| SCHEMBL7259074 | 0.71 | — | — | |
| SCHEMBL18129766 | 0.69 | — | — | |
| SCHEMBL1801328 | 0.69 | ADRA2A (0.42) | — | |
| SCHEMBL22553 | 0.69 | — | — | |
| SCHEMBL6356181 | 0.69 | — | — | |
| SCHEMBL5151 | 0.69 | — | — | |
| SCHEMBL15407577 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0748613-B1 | Surgical pins | ETHICON INC (US) | 2003-11-26 | — | — | EP | claimed |
| EP-1096318-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-05-09 | — | — | EP | disclosed |
| US-6667145-B1 | Resist composition comprising as a base resin a polymer having highly adherent, highly rigid units and especially suited as micropatterning material for VLSI fabrication, and (2) a patterning process using the resist | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-23 | — | — | US | disclosed |
| EP-1096318-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |