SCHEMBL5187008

SCHEMBL5187008

NC(=O)c1ccc2c3ccc4c5c(ccc(c6ccc(C(N)=O)c1c26)c53)C(=O)NC4=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.41
▸ PARP1 P09874 2/20 0.41
▸ MEN1 O00255 2/20 0.41
▸ RGS12 O14924 1/20 0.41
▸ USP2 O75604 1/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ POLB P06746 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ MAPT P10636 1/20 0.41
▸ THRB P10828 1/20 0.41
▸ CYP2C9 P11712 1/20 0.41
▸ APEX1 P27695 1/20 0.41
▸ CASP1 P29466 1/20 0.41
▸ BRCA1 P38398 1/20 0.41
▸ MTOR P42345 1/20 0.41
▸ RECQL P46063 1/20 0.41
▸ BLM P54132 1/20 0.41
▸ CASP7 P55210 1/20 0.41
▸ GNAI1 P63096 1/20 0.41
▸ HBB P68871 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6932422 0.84 CHEK1 (0.36) KMT2APARP1MEN1RGS12USP2
SCHEMBL15959088 0.81 PLA2G2A (0.36) KMT2APARP1MEN1RGS12USP2
SCHEMBL15959097 0.81 PLA2G2A (0.36) KMT2APARP1MEN1RGS12USP2
SCHEMBL30606639 0.81 PARP1 (0.50) KMT2APARP1MEN1RGS12USP2
SCHEMBL29541 0.81 PARP1 (0.50) KMT2APARP1MEN1RGS12USP2
SCHEMBL175754 0.81 CYP1A2 (0.43) KMT2APARP1MEN1CYP1A2POLB
SCHEMBL7601076 0.81 PARP1 (0.50) KMT2APARP1MEN1RGS12USP2
SCHEMBL7598089 0.81 PARP1 (0.50) KMT2APARP1MEN1RGS12USP2
SCHEMBL11051768 0.79 KMT2A (0.36) KMT2APARP1MEN1RGS12USP2
SCHEMBL2870204 0.79 CHEK1 (0.34) KMT2APARP1CYP1A2MAPTCHEK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100335482-C Method for converting perylen-3,4:9,10-tetracarboxylic acid diimides into a form suitable for use as a fluorescent dye BASF AG (DE) 2007-09-05 — — CN claimed
CN-1247587-C Tertiary alkyl phenoxy substituted polycyclic compound BASF AG (DE) 2006-03-29 — — CN claimed
CN-1659237-A Method for converting perylen-3,4:9,10-tetracarboxylic acid diimides into a form suitable for use as a fluorescent dye BASF AG (DE) 2005-08-24 — — CN claimed
CN-1525975-A Tertiary alkyl phenoxy substituted polycyclic compound �����ɷ� 2004-09-01 — — CN claimed
CN-1104469-C Bifluorophoric perylene developers CIBA SC HOLDING AG (CH) 2003-04-02 — — CN claimed
EP-0960167-B1 BIFLUOROPHORIC PERYLENE COLOURANTS CIBA SC HOLDING AG (CH) 2002-08-14 — — EP claimed
EP-0711812-B1 Method of preparation of perylene imides, novel di-, tri-, and tetrachromophore perylene dyestuffs and their utilization CIBA SC HOLDING AG (CH) 2001-08-29 — — EP claimed
EP-0960167-A1 BIFLUOROPHORIC PERYLENE COLOURANTS Ciba SC Holding AG (CH) 1999-12-01 — — EP claimed
CN-1237193-A Bifluorophoric perylene colourants CIBA SC HOLDING AG (CH) 1999-12-01 — — CN claimed
US-5929239-A Bifluorophoric perylene colourants CIBA SPECIALTY CHEMICALS CORPORATION (US) 1999-07-27 — — US claimed
WO-1998032799-A1 BIFLUOROPHORIC PERYLENE COLOURANTS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 1998-07-30 — — WO claimed
US-5693808-A Process for the preparation of peryleneimides, novel di-, tri- and tetrachromophoric perylene dyes and their use CIBA SPECIALTY CHEMICALS CORPORATION (US) 1997-12-02 — — US claimed
US-4714666-A PRINTING FORMS, PRINTED CIRCUITS HOECHST AKTIENGESELLSCHAFT (DE) 1987-12-22 — — US claimed
CN-114940773-B PET/epoxy resin ultrathin composite film and preparation method thereof 拓迪化学(上海)有限公司 2023-05-30 — — CN disclosed
US-9680103-B2 Organic photoelectric conversion element composition, thin film and photovoltaic cell each containing the same, organic semiconductor polymer and compound each for use in these, and method of producing the polymer FUJIFILM CORPORATION (JP) 2017-06-13 — — US disclosed
CN-103732720-B Lu Dai perylene base semiconductor material BASF SE (DE) 2016-02-17 — — CN disclosed
US-4714666-A PRINTING FORMS, PRINTED CIRCUITS HOECHST AKTIENGESELLSCHAFT (DE) 1987-12-22 — — US disclosed
US-4390609-A Electrophotographic recording material with abrasion resistant overcoat HOECHST AKTIENGESELLSCHAFT (DE) 1983-06-28 — — US disclosed
US-4224395-A FLEXIBILITY HOECHST AKTIENGESELLSCHAFT (DE) 1980-09-23 — — US disclosed
US-4220697-A NOT PRONE TO FORMATION OF HAIRLINE CRACKS WHEN REPEATEDLY CONDUCTED OVER ROLLERS HOECHST AKTIENGESELLSCHAFT (DE) 1980-09-02 — — US disclosed
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