Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 8/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.54 |
| ▸ | AR | P10275 | 2/20 | 0.54 |
| ▸ | MEN1 | O00255 | 2/20 | 0.54 |
| ▸ | USP2 | O75604 | 2/20 | 0.54 |
| ▸ | MAPT | P10636 | 2/20 | 0.54 |
| ▸ | CASP1 | P29466 | 2/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.54 |
| ▸ | TP53 | P04637 | 1/20 | 0.54 |
| ▸ | PGR | P06401 | 1/20 | 0.54 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.54 |
| ▸ | DRD1 | P21728 | 1/20 | 0.54 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.54 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.54 |
| ▸ | PDE4A | P27815 | 1/20 | 0.54 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.54 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1345198 | 0.93 | ESR1 (0.50) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| SCHEMBL1345526 | 0.93 | ESR1 (0.50) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| SCHEMBL1345213 | 0.93 | ESR1 (0.50) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| SCHEMBL1346231 | 0.93 | ESR1 (0.50) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| SCHEMBL4399352 | 0.89 | ESR1 (0.72) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| SCHEMBL15290876 | 0.87 | KLF10 (0.70) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| SCHEMBL27365471 | 0.86 | CYP3A4 (0.60) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| SCHEMBL3126865 | 0.85 | ESR1 (0.59) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| Hydrochloric Acid SCHEMBL11678998 | 0.84 | ESR1 (0.51) | ESR1ESR2CYP3A4SMN1; SMN2AR | |
| SCHEMBL71922 | 0.83 | CYP3A4 (0.73) | ESR1ESR2CYP3A4SMN1; SMN2AR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-2191643-A | — | — | None | — | — | JP | disclosed |
| WO-2026101220-A1 | POLYOXYMETHYLENE RESIN COMPOSITION AND MOLDED ARTICLE PREPARED THEREFROM | 코오롱이앤피 주식회사 | 2026-05-15 | — | — | WO | disclosed |
| US-20240043768-A1 | PROCESS FOR PREPARING HOMO- AND COPOLYMERS OF ALKYL (METH)ACRYLATES WITH LOW RESIDUAL MONOMER CONTENT | EVONIK OPERATIONS GMBH (DE) | 2024-02-08 | — | — | US | disclosed |
| EP-4032944-B1 | METHOD FOR PRODUCING OXYMETHYLENE COPOLYMER RESIN COMPOSITION, AND OXYMETHYLENE COPOLYMER RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2023-12-13 | — | — | EP | disclosed |
| US-11820857-B2 | Method for producing oxymethylene copolymer resin composition, and oxymethylene copolymer resin composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230331017-A1 | IODONIUM SALT INITIATOR AND PROCESSING-FREE THERMALLY SENSITIVE PLATE PRECURSOR CONTAINING THEREOF, AND PROCESSING-FREE THERMALLY SENSITIVE PLATE AND USE THEREOF | Lucky Huaguang Graphics. Co., Ltd. (CN) | 2023-10-19 | — | — | US | disclosed |
| EP-4261203-A1 | IODONIUM SALT INITIATOR AND PROCESSING-FREE THERMALLY SENSITIVE PLATE PRECURSOR CONTAINING THEREOF, AND PROCESSING-FREE THERMALLY SENSITIVE PLATE AND USE THEREOF | Lucky Huaguang Graphics Co., Ltd (CN) | 2023-10-18 | — | — | EP | disclosed |
| EP-3133123-B1 | SEMIAROMATIC POLYAMIDE RESIN COMPOSITION AND FORMED BODY OBTAINED BY FORMING SAME | UNITIKA LTD (JP) | 2022-12-28 | — | — | EP | disclosed |
| US-20220356290-A1 | METHOD FOR PRODUCING OXYMETHYLENE COPOLYMER RESIN COMPOSITION, AND OXYMETHYLENE COPOLYMER RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-11-10 | — | — | US | disclosed |
| CN-114402028-B | Method for producing oxymethylene copolymer resin composition, and oxymethylene copolymer resin composition | 三菱瓦斯化学株式会社 | 2022-08-30 | — | — | CN | disclosed |
| EP-0497465-B1 | Record material | APPLETON PAPER INC (US) | 1997-06-04 | — | — | EP | disclosed |
| EP-0366377-B1 | Hydrogenated copolymer rubber, rubber composition comprising said rubber, and rubber product obtained from the rubber | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-12-14 | — | — | EP | disclosed |
| US-5252431-A | Light sensitive layer and silicone rubber layer; spraying pressurized liquid on the surface to remove the rubber layer | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-12 | — | — | US | disclosed |
| EP-0497465-A1 | Record material | APPLETON PAPERS INC. (US) | 1992-08-05 | — | — | EP | disclosed |
| US-5093426-A | Good resistance to low temperature, heat, ozone and oil | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-03 | — | — | US | disclosed |
| JP-H02191643-A | THERMOPLASTIC BLEND AND PRODUCTION THEREOF | KAYAKU NUURII KK | 1990-07-27 | — | — | JP | disclosed |
| US-4705775-A | Recording material employing chromogenic bisquinazolines | CIBA-GEIGY CORPORATION (US) | 1987-11-10 | — | — | US | disclosed |
| EP-0109930-B1 | CHROMOGENIC BIS-QUINAZOLINE COMPOUNDS, METHOD OF PREPARING THEM AND THEIR USE AS CHROMOGENES IN PRESSURE-SENSITIVE OR HEAT-SENSITIVE RECORDING MATERIALS | CIBA-GEIGY AG (CH) | 1986-09-17 | — | — | EP | disclosed |
| EP-0109930-A1 | Chromogenic bis-quinazoline compounds, method of preparing them and their use as chromogenes in pressure-sensitive or heat-sensitive recording materials | CIBA-GEIGY AG (CH) | 1984-05-30 | — | — | EP | disclosed |
| US-4003960-A | CATALYTIC COPOLYMERIZATION OF A POLYLACTAM AND FORMALDEHYDE | SOCIETA'ITALIANA RESINE S.I.R. S.P.A. (IT) | 1977-01-18 | — | — | US | disclosed |