SCHEMBL4399352

SCHEMBL4399352

CCc1cc(C(C)(C)CC)ccc1O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 8/20 0.72
ESR2 Q92731 5/20 0.72
KLF10 Q13118 1/20 0.52
CYP2D6 P10635 3/20 0.47
CYP3A4 P08684 2/20 0.47
HIF1A Q16665 1/20 0.47
MAPK1 P28482 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
NPC1 O15118 1/20 0.46
LMNA P02545 1/20 0.46
CASP3 P42574 1/20 0.46
RAB9A P51151 1/20 0.46
ATM Q13315 1/20 0.46
SENP8 Q96LD8 1/20 0.46
SENP7 Q9BQF6 1/20 0.46
SENP6 Q9GZR1 1/20 0.46
AR P10275 2/20 0.46
BACE1 P56817 1/20 0.44
MEN1 O00255 1/20 0.43
USP2 O75604 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL51936 0.89 ESR1 (0.56) ESR1ESR2KLF10CYP2D6CYP3A4
SCHEMBL15290876 0.87 KLF10 (0.70) ESR1ESR2KLF10CYP2D6CYP3A4
SCHEMBL5964677 0.85 CYP3A4 (0.65) ESR1ESR2KLF10CYP2D6CYP3A4
SCHEMBL12588047 0.84 ESR1 (1.00) ESR1ESR2KLF10CYP2D6AR
SCHEMBL8062965 0.84 ESR1 (0.71) ESR1ESR2KLF10CYP2D6CYP3A4
SCHEMBL30234175 0.84 ESR1 (0.71) ESR1ESR2KLF10CYP2D6CYP3A4
SCHEMBL122862 0.84 ESR1 (0.71) ESR1ESR2KLF10CYP2D6CYP3A4
SCHEMBL1229448 0.84 ESR1 (0.71) ESR1ESR2KLF10CYP2D6SMN1; SMN2
SCHEMBL29395018 0.84 ESR1 (0.71) ESR1ESR2KLF10CYP2D6CYP3A4
Hydrochloric Acid SCHEMBL11678998 0.84 ESR1 (0.51) ESR1ESR2KLF10CYP2D6CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8232039-B2 Polymer and resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-07-31 US disclosed
US-8173352-B2 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-08 US disclosed
US-20100151380-A1 RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-17 US disclosed
US-20100136481-A1 RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-03 US disclosed
US-20100124719-A1 Polymer and Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-05-20 US disclosed
US-20100081085-A1 Polymer and Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-04-01 US disclosed