SCHEMBL5200655

SCHEMBL5200655

CCO[Si](C)(CCCC(N)(CN)CCC[Si](C)(OCC)OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6707434 0.87
SCHEMBL6708446 0.85
SCHEMBL6707419 0.84 DNM1 (0.31)
SCHEMBL6709871 0.84 DNM1 (0.31)
SCHEMBL6708616 0.84 DNM1 (0.31)
SCHEMBL6708683 0.84 DNM1 (0.31)
SCHEMBL1070269 0.82
SCHEMBL963362 0.80
SCHEMBL28537855 0.77
SCHEMBL37811 0.74 CYP1A2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020054644-A1 PERMANENT FILM-FORMING PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC DEVICE, CURED FILM PRODUCTION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 住友ベークライト株式会社 2020-03-19 WO disclosed
EP-1817364-A2 CROSSLINKABLE SILOXANE-UREA COPOLYMERS Wacker Chemie AG (DE) 2007-08-15 EP disclosed
EP-1771496-A1 CROSS-LINKABLE SILOXANE UREA COPOLYMERS Wacker Chemie AG (DE) 2007-04-11 EP disclosed
WO-2006058656-A2 CROSSLINKABLE SILOXANE-UREA COPOLYMERS WACKER CHEMIE AG (DE) 2006-06-08 WO disclosed
WO-2006010486-A1 CROSS-LINKABLE SILOXANE UREA COPOLYMERS WACKER CHEMIE AG (DE) 2006-02-02 WO disclosed
US-20040028978-A1 Proton conducting membrane, method for producing the same, and fuel cell using the same NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-02-12 US disclosed
EP-1334993-A2 Proton conducting membrane, method for producing the same, and fuel cell using the same National Institute of Advanced Industrial Science and Technology (JP) 2003-08-13 EP disclosed