⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6711994 | 0.83 | — | — | |
| SCHEMBL6711920 | 0.82 | — | — | |
| SCHEMBL6711819 | 0.82 | — | — | |
| SCHEMBL6709932 | 0.82 | — | — | |
| SCHEMBL6709903 | 0.82 | — | — | |
| SCHEMBL6708299 | 0.82 | — | — | |
| SCHEMBL291934 | 0.81 | LMNA (0.33) | — | |
| SCHEMBL5200655 | 0.80 | — | — | |
| SCHEMBL28573163 | 0.75 | — | — | |
| SCHEMBL5407043 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| CN-114057962-A | Polymer double-chain/inorganic nano-particle asymmetric compound and preparation method thereof | 清华大学 | 2022-02-18 | — | — | CN | disclosed |
| CN-114057961-A | Polymer double-chain/inorganic nanoparticle composite Janus material and preparation method thereof | 清华大学 | 2022-02-18 | — | — | CN | disclosed |
| WO-2020054772-A1 | POLYARYLENE SULFIDE RESIN COMPOSITION, MOLDED ARTICLE, AND INSERT-MOLDED ARTICLE | ポリプラスチックス株式会社 | 2020-03-19 | — | — | WO | disclosed |
| WO-2020054644-A1 | PERMANENT FILM-FORMING PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC DEVICE, CURED FILM PRODUCTION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 住友ベークライト株式会社 | 2020-03-19 | — | — | WO | disclosed |
| US-10589494-B2 | Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window | FUJIFILM CORPORATION (JP) | 2020-03-17 | — | — | US | disclosed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| US-20180079917-A1 | HEAT INSULATION PAINT | FUJIFILM CORPORATION (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20170320302-A1 | FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-7859006-B2 | Semiconductor light emitting device member, method for manufacturing such semiconductor light emitting device member and semiconductor light emitting device using such semiconductor light emitting device member | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-12-28 | — | — | US | disclosed |
| EP-2239137-A1 | HYDROPHILIC MEMBERS | FUJIFILM Corporation (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20090008673-A1 | Semiconductor Light Emitting Device Member, Method for Manufacturing Such Semiconductor Light Emitting Device Member and Semiconductor Light Emitting Device Using Such Semiconductor Light Emitting Device Member | MITSUSBISHI CHEMICAL CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
| US-7312013-B2 | Photoreactive composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040202956-A1 | a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-10-14 | — | — | US | disclosed |
| EP-1391476-A1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-02-25 | — | — | EP | disclosed |
| US-20040028978-A1 | Proton conducting membrane, method for producing the same, and fuel cell using the same | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2004-02-12 | — | — | US | disclosed |
| EP-1334993-A2 | Proton conducting membrane, method for producing the same, and fuel cell using the same | National Institute of Advanced Industrial Science and Technology (JP) | 2003-08-13 | — | — | EP | disclosed |
| US-4529659-A | Magnetic recording member and process for manufacturing the same | NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION (JP) | 1985-07-16 | — | — | US | disclosed |