Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.58 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.58 |
| ▸ | KIF11 | P52732 | 1/20 | 0.49 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | TUBB1 | Q9H4B7 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | PGR | P06401 | 1/20 | 0.38 |
| ▸ | RORA | P35398 | 1/20 | 0.38 |
| ▸ | RORC | P51449 | 1/20 | 0.38 |
| ▸ | RORB | Q92753 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29366534 | 1.00 | ALDH1A1 (0.58) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 | |
| SCHEMBL30043704 | 1.00 | ALDH1A1 (0.58) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 | |
| SCHEMBL23403853 | 0.92 | KDM4E (0.48) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 | |
| SCHEMBL14090447 | 0.88 | KDM4E (0.48) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 | |
| SCHEMBL18561725 | 0.87 | KDM4E (0.44) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 | |
| Benzophenone SCHEMBL28129952 | 0.86 | ATM (0.46) | ALDH1A1MAPK1SMN1; SMN2KDM4EPTGS2 | |
| SCHEMBL29895747 | 0.83 | KIF11 (0.47) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 | |
| SCHEMBL29366197 | 0.83 | KIF11 (0.47) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 | |
| SCHEMBL599926 | 0.83 | KIF11 (0.47) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 | |
| SCHEMBL23403863 | 0.83 | ALDH1A1 (0.40) | ALDH1A1MAPK1SMN1; SMN2KDM4EKIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3027 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035745-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | ILLUMINA INC (US) | 2026-02-05 | — | — | US | claimed |
| US-20260008909-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | ILLUMINA INC (US) | 2026-01-08 | — | — | US | claimed |
| EP-4630153-A1 | ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | Illumina, Inc. (US) | 2025-10-15 | — | — | EP | claimed |
| US-20250171566-A1 | LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | STRATASYS INC (US) | 2025-05-29 | — | — | US | claimed |
| US-20240337582-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | ILLUMINA, INC. | 2024-10-10 | — | — | US | claimed |
| CN-118290657-A | Photocurable composition and application thereof | 常州强力先端电子材料有限公司 | 2024-07-05 | — | — | CN | claimed |
| US-20240219835-A1 | ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | ILLUMINA, INC. | 2024-07-04 | — | — | US | claimed |
| US-12013330-B2 | Resin composition and flow cells incorporating the same | ILLUMINA, INC. (US) | 2024-06-18 | — | — | US | claimed |
| WO-2024123748-A1 | ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | ILLUMINA, INC. (US) | 2024-06-13 | — | — | WO | claimed |
| US-20240132954-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | ILLUMINA CAMBRIDGE LIMITED (GB) | 2024-04-25 | — | — | US | claimed |
| EP-0824720-B1 | ACID BLEACHABLE DYE CONTAINING LITHOGRAPHIC PRINTING PLATE COMPOSITION | MINNESOTA MINING & MFG (US) | 1999-09-22 | — | — | EP | claimed |
| CN-1183146-A | Lithographic printing plate compositions containing acid bleachable dyes | MINNESOTA MINING & MFG (US) | 1998-05-27 | — | — | CN | claimed |
| EP-0824720-A1 | ACID BLEACHABLE DYE CONTAINING LITHOGRAPHIC PRINTING PLATE COMPOSITION | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-02-25 | — | — | EP | claimed |
| US-5665522-A | Visible image dyes for positive-acting no-process printing plates | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-09-09 | — | — | US | claimed |
| EP-0767931-A1 | INCREASING THE USEFUL RANGE OF CATIONIC PHOTOINITIATORS IN STEREOLITHOGRAPHY | AlliedSignal Inc. (US) | 1997-04-16 | — | — | EP | claimed |
| WO-1996035143-A1 | ACID BLEACHABLE DYE CONTAINING LITHOGRAPHIC PRINTING PLATE COMPOSITION | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-11-07 | — | — | WO | claimed |
| US-5494618-A | POLYMERIZING VINYL ETHER AND EPOXIDES USING ANTHRACENE OR COMPOUNDS AS ULTRAVIOLET LIGHT ABSORBERS, AND ONIUM SALT AS PHOTOINITIATOR | ALLIEDSIGNAL INC. (US) | 1996-02-27 | — | — | US | claimed |
| WO-1996000412-A1 | INCREASING THE USEFUL RANGE OF CATIONIC PHOTOINITIATORS IN STEREOLITHOGRAPHY | ALLIEDSIGNAL INC. (US) | 1996-01-04 | — | — | WO | claimed |
| US-4523982-A | MONOVINYLIDENE DILUENT | THE DOW CHEMICAL COMPANY (US) | 1985-06-18 | — | — | US | claimed |
| US-4069054-A | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1978-01-17 | — | — | US | claimed |