Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 3/20 | 0.43 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | LTA4H | P09960 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.37 |
| ▸ | HTR6 | P50406 | 1/20 | 0.37 |
| ▸ | ESRRG | P62508 | 1/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1468098 | 0.95 | AR (0.46) | ARHTTHIF1AHSD17B10KDM4E | |
| SCHEMBL8957781 | 0.88 | AR (0.43) | ARHTTHIF1AKDM4EMEN1 | |
| SCHEMBL7630191 | 0.86 | AR (0.45) | ARHTTHIF1AHSD17B10KDM4E | |
| SCHEMBL8957665 | 0.85 | AR (0.39) | ARHTTHIF1AHSD17B10KDM4E | |
| SCHEMBL7625145 | 0.84 | AR (0.39) | ARHTTHIF1AHSD17B10KDM4E | |
| SCHEMBL7189264 | 0.83 | MEN1 (0.42) | HTTTSHRMEN1GAAKMT2A | |
| SCHEMBL1803446 | 0.82 | MAPT (0.40) | HTTKDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL27683333 | 0.81 | MTNR1A (0.44) | HTTLTA4HPPARDPOLBTDP1 | |
| SCHEMBL4198618 | 0.80 | AR (0.50) | ARHTTHIF1AKDM4EMEN1 | |
| SCHEMBL30537232 | 0.80 | AR (0.50) | ARHTTHIF1AKDM4EMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1840654-B1 | Radiation-sensitive negative resin composition | JSR CORP (JP) | 2013-03-20 | — | — | EP | disclosed |
| EP-1477848-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20070237890-A1 | Bilayer Laminated Film for Bump Formation and Method of Bump Formation | JSR CORPORATION (JP) | 2007-10-11 | — | — | US | disclosed |
| US-20070231747-A1 | Radiation-sensitive negative resin composition | JSR CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| EP-1840654-A1 | Radiation-sensitive negative resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | disclosed |
| US-7265044-B2 | Method for forming bump on electrode pad with use of double-layered film | JSR CORPORATION (JP) | 2007-09-04 | — | — | US | disclosed |
| EP-1826612-A1 | Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings | JSR Corporation (JP) | 2007-08-29 | — | — | EP | disclosed |
| US-20070196765-A1 | RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATINGS, TRANSFER FILM, AND PROCESS FOR PRODUCING PLATINGS | JSR CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |
| US-7141355-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-11-28 | — | — | US | disclosed |
| US-20050277245-A1 | Method for forming bump on electrode pad with use of double-layered film | JSR CORPORATION (JP) | 2005-12-15 | — | — | US | disclosed |
| EP-1542520-A1 | METHOD FOR FORMING BUMP ON ELECTRODE PAD WITH USE OF DOUBLE-LAYERED FILM | JSR Corporation (JP) | 2005-06-15 | — | — | EP | disclosed |
| EP-1477848-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-11-17 | — | — | EP | disclosed |
| US-20040142280-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |