SCHEMBL52259

SCHEMBL52259

FC(F)(F)C(F)(F)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrafluoroethylene SCHEMBL6342942 0.82
SCHEMBL607360 0.80
Bromide SCHEMBL6542209 0.78
SCHEMBL18380807 0.75
SCHEMBL22141681 0.75
SCHEMBL607359 0.75
SCHEMBL11664715 0.75
SCHEMBL226086 0.75
SCHEMBL697411 0.75 LMNA (0.33)
SCHEMBL1317224 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2189 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122054927-A High conductivity passivation layer and method of forming the same during high aspect ratio plasma etching 乔治洛德方法研究和开发液化空气有限公司 2026-05-15 CN claimed
US-12508791-B2 Fire extinguishing air bubble film filled with gaseous fire-extinguishing medium, and manufacturing method therefor CIVIL AVIATION UNIVERSITY OF CHINA (CN) 2025-12-30 US claimed
US-20250381431-A1 ALL-SOLID-STATE RECHARGEABLE BATTERY STRUCTURE SAMSUNG SDI CO., LTD. (KR) 2025-12-18 US claimed
WO-2025128603-A1 BOW CONTROL OF HIGH ASPECT RATIO FEATURES DURING CRYOGENIC ETCH LAM RESEARCH CORPORATION (US) 2025-06-19 WO claimed
CN-120137738-A Compositions comprising iodofluorocarbons 阿科玛法国公司 2025-06-13 CN claimed
US-12311407-B2 Inertization of material surfaces by functionalized perfluorinated molecules TECHNISCHE UNIVERSITAT BERLIN (DE) 2025-05-27 US claimed
US-20250154409-A1 ETCHING METHOD RESONAC CORPORATION (JP) 2025-05-15 US claimed
CN-119977753-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-13 CN claimed
CN-119954594-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-09 CN claimed
CN-119954592-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-09 CN claimed
EP-0687287-A1 FLUOROIODOCARBON BLENDS AS CFC AND HALON REPLACEMENTS IKON CORPORATION (US) 1995-12-20 EP claimed
EP-0552076-B1 Synthesis of perfluoroalkyliodides ATOCHEM ELF SA (FR) 1995-10-11 EP claimed
US-5444102-A USING A FOAM BLOWING AGENT IKON CORPORATION (US) 1995-08-22 US claimed
WO-1994020588-A1 FLUOROIODOCARBON BLENDS AS CFC AND HALON REPLACEMENTS IKON CORPORATION (US) 1994-09-15 WO claimed
US-5268516-A Telomerization of tetrafluoroethylene by (penta or hepta) fluoroisopropyl iodide ELF ATOCHEM S.A. (FR) 1993-12-07 US claimed
EP-0133805-B1 TRIAZOLE ANTIFUNGAL AGENTS Pfizer Limited (GB) 1988-09-21 EP claimed
US-4675088-A FLUOROCARBONS CONTAINING OXYPENTAFLUOROTELLURIUM GROUP THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 1987-06-23 US claimed
EP-0133805-A2 Triazole antifungal agents Pfizer Limited (GB) 1985-03-06 EP claimed
US-4118290-A Process for the preparation of perfluoroethyl iodide HOECHST AKTIENGESELLSCHAFT (DE) 1978-10-03 US claimed
US-3933931-A PERFLUOROETHYL IODIDE FROM IODINE, IODINE PENTAFLUORIDE AND TETRAFLUOROETHYLENE, NIOBIUM, TANTALUM, MOLYBDENUM OR BORON FLUORIDE CATALYST ASAHI GLASS CO., LTD. (JA) 1976-01-20 US claimed