Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.37 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.37 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.37 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.37 |
| ▸ | GALR3 | O60755 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4820046 | 0.85 | TSHR (0.48) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL523167 | 0.82 | TSHR (0.50) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL22325533 | 0.79 | TSHR (0.52) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL10893076 | 0.73 | TSHR (0.46) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL11851987 | 0.70 | TSHR (0.48) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL141447 | 0.70 | TSHR (0.48) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL10889597 | 0.70 | TSHR (0.37) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL3338084 | 0.69 | TSHR (0.41) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL2268030 | 0.68 | TSHR (0.46) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL11755918 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118983520-A | Preparation of lithium iron manganese phosphate battery electrolyte | 安徽得壹能源科技有限公司 | 2024-11-19 | — | — | CN | claimed |
| WO-2024172770-A1 | PRINTABLE WAX, METHOD OF PRINTING, AND METHOD FOR FLOW VISCOSITY CONTROL | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2024-08-22 | — | — | WO | claimed |
| WO-2018051290-A1 | ANODE MATERIALS FOR LITHIUM-ION ELECTROCHEMCIAL CELLS AND METHODS OF MAKING AND USING SAME | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2018-03-22 | — | — | WO | claimed |
| US-8039049-B2 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2011-10-18 | — | — | US | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| WO-2007040834-A2 | PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040816-A2 | TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040856-A2 | PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| CN-118983520-A | Preparation of lithium iron manganese phosphate battery electrolyte | 安徽得壹能源科技有限公司 | 2024-11-19 | — | — | CN | disclosed |
| CN-118983520-A | Preparation of lithium iron manganese phosphate battery electrolyte | 安徽得壹能源科技有限公司 | 2024-11-19 | — | — | CN | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |