SCHEMBL523167

SCHEMBL523167

CC(=O)OC(C)[Si](Cl)(Cl)Cl

nearest known ligand 0.50

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.50
CHRM2 P08172 1/20 0.38
CHRM4 P08173 1/20 0.38
CHRM1 P11229 1/20 0.38
TBXA2R P21731 1/20 0.38
GALR3 O60755 1/20 0.37
MAPT P10636 1/20 0.37
BLM P54132 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
TRPV1 Q8NER1 1/20 0.35
ALDH1A1 P00352 2/20 0.32
TDP1 Q9NUW8 1/20 0.31
ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4820046 0.82 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL523162 0.82 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL4196691 0.77 TSHR (0.42) TSHRALDH1A1
SCHEMBL22325533 0.76 TSHR (0.52) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL141447 0.72 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL11851987 0.72 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL10893076 0.70 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL2268030 0.70 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL11755918 0.69
SCHEMBL935573 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 193 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
US-7405168-B2 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMITED (JP) 2008-07-29 US claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
CN-115380013-B Gradient glass-like ceramic structure and bottom-up preparation method thereof 盖列斯特有限公司 2024-12-27 CN disclosed
US-20240384036-A1 GRADIENT GLASS-LIKE CERAMIC STRUCTURES AND BOTTOM-UP FABRICATION METHOD THEREOF GELEST, INC. 2024-11-21 US disclosed
EP-4132892-A2 GRADIENT GLASS-LIKE CERAMIC STRUCTURES AND BOTTOM-UP FABRICATION METHOD THEREOF GELEST, INC. (US) 2023-02-15 EP disclosed
CN-111051370-B Amphoteric graft copolymer and medical device having enhanced adhesive strength 贝克顿·迪金森公司 2023-01-06 CN disclosed
EP-0950112-A1 PHOTOLABILE POLYMER ARRAY SYNTHESIS METHODS Affymetrix, Inc. (a California Corporation) (US) 1999-10-20 EP disclosed
US-5959098-A ACTIVATING AND COUPLING MONOMERS IN DIFFERENT SELECTED ZONES OF SUBSTRATE FORMING DIFFERENT SEQUENCES IN DIFFERENT AREAS; ACTIVATING BY DIRECTING RADIATION AT SURFACE OF SUBSTRATE WITH FUNCTIONAL GROUPS PROTECTED BY PHOTOLABILE GROUPS AFFYMETRIX, INC. (US) 1999-09-28 US disclosed
WO-1997039151-A1 PHOTOLABILE POLYMER ARRAY SYNTHESIS METHODS AFFYMETRIX, INC. (US) 1997-10-23 WO disclosed
US-3962160-A NOVEL ORGANOFUNCTIONAL (KETOXIMINO) SILANES AND ROOM TEMPERATURE, VULCANIZABLE COMPOSITIONS CONTAINING THE SAME GENERAL ELECTRIC COMPANY (US) 1976-06-08 US disclosed