SCHEMBL523168

SCHEMBL523168

CC(=O)OCC[Si](Cl)(Cl)Cl

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.46
CHRM5 P08912 2/20 0.44
CHRM1 P11229 2/20 0.44
CHRM3 P20309 2/20 0.44
PGR P06401 1/20 0.44
CHRM2 P08172 1/20 0.44
CHRM4 P08173 1/20 0.44
HTR1A P08908 1/20 0.44
CHRNB2 P17787 1/20 0.44
TBXA2R P21731 1/20 0.44
CHRNB4 P30926 1/20 0.44
CHRNA3 P32297 1/20 0.44
CHRNA7 P36544 1/20 0.44
CHRNA4 P43681 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
CHRNA10 Q9GZZ6 1/20 0.44
CHRNA9 Q9UGM1 1/20 0.44
TSHR P16473 1/20 0.44
GALR3 O60755 2/20 0.43
GAA P10253 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL133944 0.86 ALDH1A1 (0.54) ALDH1A1CHRM5CHRM1CHRM3PGR
Methyl Alcohol SCHEMBL28209288 0.84 ALDH1A1 (0.52) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL523505 0.83 ALDH1A1 (0.44) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL523163 0.83 ALDH1A1 (0.44) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL1806859 0.82 ALDH1A1 (0.50) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL19770568 0.82 ALDH1A1 (0.50) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL19770552 0.82 ALDH1A1 (0.50) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL2531847 0.82 ALDH1A1 (0.50) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL29403870 0.82 ALDH1A1 (0.50) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL7908273 0.82 ALDH1A1 (0.50) ALDH1A1CHRM5CHRM1CHRM3PGR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 285 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240401204-A1 METHOD AND COMPOSITION FOR ADJUSTING HYDROPHILICITY OF METAL USING A POLYPHENOL AND A SILANE MODIFIED NANO PARTICULATE OR AMINO ACID AMND SILICA Bulk Chemicals (US) 2024-12-05 US claimed
CN-118983520-A Preparation of lithium iron manganese phosphate battery electrolyte 安徽得壹能源科技有限公司 2024-11-19 CN claimed
CN-117790906-A Additive for lithium ion battery electrolyte and lithium iron manganese phosphate battery electrolyte 昆明理工大学 2024-03-29 CN claimed
US-11351478-B2 Oil skimmer with oleophilic coating UCHICAGO ARGONNE, LLC (US) 2022-06-07 US claimed
US-20200078705-A1 OIL SKIMMER WITH OLEOPHILIC COATING UCHICAGO ARGONNE LLC (US) 2020-03-12 US claimed
WO-2018011675-A1 GRAPHENE COMPOUND, METHOD FOR FORMING GRAPHENE COMPOUND, AND POWER STORAGE DEVICE SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) 2018-01-18 WO claimed
US-20180019462-A1 Graphene Compound, Method for Forming Graphene Compound, and Power Storage Device SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) 2018-01-18 US claimed
CN-104311593-A Synthesis method of mono functional group octa-polysilsesquioxane UNIV SHANGHAI 2015-01-28 CN claimed
CN-104262385-A Synthesis method of monofunctional heptaphenyl silsesquioxane UNIV SHANGHAI 2015-01-07 CN claimed
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
EP-0637902-B1 Metallic foil with adhesion promoting layer GOULD ELECTRONICS INC (US) 1999-03-31 EP claimed
EP-0637902-A1 Metallic foil with adhesion promoting layer GOULD ELECTRONICS INC. (US) 1995-02-08 EP claimed