SCHEMBL52405

SCHEMBL52405

COc1c2ccccc2c(OC)c2ccccc12

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 1.00
KDM4E B2RXH2 3/20 1.00
SMN1; SMN2 Q16637 2/20 1.00
MAPK1 P28482 1/20 1.00
POLB P06746 1/20 0.64
CYP1A2 P05177 2/20 0.50
CYP2C19 P33261 1/20 0.50
IDO1 P14902 2/20 0.48
CYP2C9 P11712 1/20 0.48
CA4 P22748 2/20 0.47
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA7 P43166 1/20 0.47
CA9 Q16790 1/20 0.47
CA14 Q9ULX7 1/20 0.47
MCL1 Q07820 1/20 0.47
MAPT P10636 1/20 0.42
EP300 Q09472 1/20 0.41
KAT8 Q9H7Z6 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29366129 1.00 ALDH1A1 (1.00) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
Iodide SCHEMBL5967814 0.97 ALDH1A1 (0.94) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
SCHEMBL757747 0.90 KDM4E (0.82) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
SCHEMBL8859782 0.90 ALDH1A1 (0.82) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
SCHEMBL30660758 0.89 KDM4E (0.79) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
SCHEMBL755681 0.89 KDM4E (0.79) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
SCHEMBL28796144 0.87 ALDH1A1 (0.75) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
SCHEMBL17189587 0.87 KDM4E (0.75) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
SCHEMBL5746719 0.87 ALDH1A1 (0.75) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB
SCHEMBL18950744 0.87 KDM4E (0.75) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2456 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250177927-A1 SUPPORTED MEMBRANES BY THERMAL AND UV INITITATED MASS POLYMERIZATION PROMERUS, LLC (US) 2025-06-05 US claimed
US-20250171566-A1 LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION STRATASYS INC (US) 2025-05-29 US claimed
US-20250122402-A1 LONG SHELF-LIFE STABLE MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS CONTAINING PYRIDINE LIGATED PALLADIUM COMPOUNDS PROMERUS, LLC (US) 2025-04-17 US claimed
WO-2024142486-A1 PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING CIRCUIT BOARD 株式会社レゾナック 2024-07-04 WO claimed
US-11897991-B2 UV active derivatives of Pd(AcAc)2 catalyzed polycycloolefin compositions as optical materials PROMERUS, LLC (US) 2024-02-13 US claimed
CN-117070171-A Epoxy die bond adhesive for small-space RGB (red, green and blue) packaging and preparation method thereof 南京科矽新材料科技有限公司 2023-11-17 CN claimed
CN-116693815-A Preparation method and application of heterogeneous deuterium ethylation reagent and deuterated vardenafil 深圳大学 2023-09-05 CN claimed
US-11746166-B2 UV active derivatives of pd(AcAc)2L catalyzed polycycloolefin compositions as optical materials PROMERUS, LLC (US) 2023-09-05 US claimed
CN-116574244-A Heterogeneous methylation reagent and preparation method thereof 深圳大学 2023-08-11 CN claimed
US-11667731-B2 Stabilized UV active organopalladium compounds as vinyl addition catalysts PROMERUS, LLC (US) 2023-06-06 US claimed
US-6313188-B1 USED AS CATALYSTS FOR CATIONIC PHOTOPOLYMERIZATION NIPPON SODA CO., LTD. (JP) 2001-11-06 US claimed
EP-0938413-A1 RADIATION-SENSITIVE COMPOSITIONS AND PRINTING PLATES Kodak Polychrome Graphics (US) 1999-09-01 EP claimed
EP-0927726-A1 PHOTOCATALYTIC COMPOSITION NIPPON SODA CO., LTD. (JP) 1999-07-07 EP claimed
US-5919601-A COMPRISING THERMAL-ACTIVATED ACID GENERATOR, CROSSLINKING RESIN, BINDER RESIN CONTAINING PENDANT GROUPS CAPABLE OF UNDERGOING ACID-CATALYZED CONDENSATION WITH CROSSLINKING RESIN, INFRARED ABSORBER KODAK POLYCHROME GRAPHICS, LLC (US) 1999-07-06 US claimed
WO-1998021038-A1 RADIATION-SENSITIVE COMPOSITIONS AND PRINTING PLATES KODAK POLYCHROME GRAPHICS (US) 1998-05-22 WO claimed
EP-0537879-B1 Aryl triflate compound, radiologically acid producing agent, radiologically acid producing agent system, and radiosensitive composition HITACHI CHEMICAL CO LTD (JP) 1998-04-29 EP claimed
EP-0537879-A1 Aryl triflate compound, radiologically acid producing agent, radiologically acid producing agent system, and radiosensitive composition HITACHI CHEMICAL CO., LTD. (JP) 1993-04-21 EP claimed
US-5198402-A ARYL TRIFLATE COMPOUND, RADIOLOGICALLY ACID PRODUCING AGENT, RADIOLOGICALLY ACID PRODUCING AGENT SYSTEM, AND RADIOSENSITIVE COMPOSITION HITACHI CHEMICAL COMPANY LTD. (JP) 1993-03-30 US claimed
EP-0313006-B1 FHOTOPOLYMERIZABLE COMPOSITION COMPRISING AN INITIATOR COMBINATION OF 1,4-OR 9,10-DIMETHOXYANTHRACENE AND A TRIHALOMETHYL-(3H)-QUINAZOLIN-4-ONE HOECHST CELANESE CORPORATION (US) 1993-03-17 EP claimed
EP-0313006-A2 Fhotopolymerizable composition comprising an initiator combination of 1,4-or 9,10-Dimethoxyanthracene and a trihalomethyl-(3H)-quinazolin-4-one HOECHST CELANESE CORPORATION (US) 1989-04-26 EP claimed