⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4527817 | 0.96 | — | — | |
| N-Propyl Bromide SCHEMBL7075476 | 0.78 | — | — | |
| SCHEMBL16272591 | 0.67 | — | — | |
| SCHEMBL9611060 | 0.64 | — | — | |
| SCHEMBL1268466 | 0.53 | — | — | |
| SCHEMBL567060 | 0.48 | — | — | |
| SCHEMBL9222316 | 0.48 | — | — | |
| SCHEMBL9723211 | 0.46 | — | — | |
| SCHEMBL1484178 | 0.43 | — | — | |
| SCHEMBL14247237 | 0.43 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 673 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250320604-A1 | LOW TEMPERATURE PLASMA DEPOSITION OF SILICON-CONTAINING FILMS USING HYDROGEN PEROXIDE | GELEST INC (US) | 2025-10-16 | — | — | US | claimed |
| US-20250305131-A1 | LOW TEMPERATURE THERMAL DEPOSITION OF SILICON-CONTAINING FILMS USING LOW WATER CONTENT HYDROGEN PEROXIDE | GELEST, INC. | 2025-10-02 | — | — | US | claimed |
| US-12049576-B2 | Silicone pressure sensitive adhesive and method of making the same | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2024-07-30 | — | — | US | claimed |
| EP-4320180-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | Momentive Performance Materials Inc. (US) | 2024-02-14 | — | — | EP | claimed |
| US-20230303502-A1 | HETEROARYL AND HETEROCYCLYL COMPOUNDS | SIGILON THERAPEUTICS, INC. | 2023-09-28 | — | — | US | claimed |
| EP-4192468-A2 | HETEROARYL AND HETEROCYCLYL COMPOUNDS | Sigilon Therapeutics, Inc. (US) | 2023-06-14 | — | — | EP | claimed |
| EP-4155375-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | claimed |
| EP-4155376-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | claimed |
| US-20220325154-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | MOMENTIVE PERFORMANCE MATERIALS INC. | 2022-10-13 | — | — | US | claimed |
| WO-2022216482-A1 | SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-10-13 | — | — | WO | claimed |
| US-6388041-B1 | LIVING POLYMER | NANO CARRIER CO LTD (JP) | 2002-05-14 | — | — | US | claimed |
| EP-1167418-A1 | POLYOXYETHYLENE DERIVATIVES HAVING OPTIONALLY PROTECTED AMINO GROUP AT ONE END AND PROCESS FOR PRODUCING THE SAME | Nano Carrier Co. (JP) | 2002-01-02 | — | — | EP | claimed |
| EP-1165637-A1 | NOVEL PROTECTED AMINE INITIATORS AND POLYMERS DERIVED THEREFROM | FMC CORPORATION (US) | 2002-01-02 | — | — | EP | claimed |
| WO-2000050479-A1 | NOVEL PROTECTED AMINE INITIATORS AND POLYMERS DERIVED THEREFROM | FMC CORPORATION (US) | 2000-08-31 | — | — | WO | claimed |
| EP-0886807-B1 | COLOR FILTER | POLAROID CORP (US) | 2000-01-12 | — | — | EP | claimed |
| EP-0886807-A1 | COLOR FILTER | POLAROID CORPORATION (US) | 1998-12-30 | — | — | EP | claimed |
| WO-1997034201-A1 | COLOR FILTER | POLAROID CORPORATION (US) | 1997-09-18 | — | — | WO | claimed |
| US-5667920-A | Process for preparing a color filter | POLAROID CORPORATION (US) | 1997-09-16 | — | — | US | claimed |
| US-5286890-A | Aromatic amine terminated silicone monomers, oligomers, and polymers therefrom | HUGHES AIRCRAFT COMPANY (US) | 1994-02-15 | — | — | US | claimed |
| US-5021585-A | Engineering thermoplastics; good optics, heat and oxidation resistance | HUGHES AIRCRAFT COMPANY (US) | 1991-06-04 | — | — | US | claimed |