⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7598956 | 0.95 | — | — | |
| SCHEMBL4962305 | 0.95 | — | — | |
| SCHEMBL2973363 | 0.95 | — | — | |
| SCHEMBL804991 | 0.95 | — | — | |
| Water SCHEMBL27495048 | 0.91 | — | — | |
| SCHEMBL9227127 | 0.86 | — | — | |
| SCHEMBL820464 | 0.84 | — | — | |
| SCHEMBL28239655 | 0.72 | — | — | |
| SCHEMBL23146430 | 0.71 | THRB (0.30) | — | |
| SCHEMBL27473320 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260049202-A1 | SILANE COMPOUND AND COMPOSITIONS CONTAINING SAME | SYNTHOMER SDN BHD (MY) | 2026-02-19 | — | — | US | claimed |
| EP-4619470-A1 | SILANE COMPOUND AND COMPOSITIONS CONTAINING SAME | Synthomer Sdn. Bhd. (MY) | 2025-09-24 | — | — | EP | claimed |
| WO-2024107042-A1 | SILANE COMPOUND AND COMPOSITIONS CONTAINING SAME | SYNTHOMER SDN BHD (MY) | 2024-05-23 | — | — | WO | claimed |
| US-20220227954-A1 | POLYMERIC SURFACE HAVING REDUCED BIOMOLECULE ADHESION TO THERMOPLASTIC ARTICLES OF SUCH SUBSTRATE | OAKTREE FUND ADMINISTRATION, LLC | 2022-07-21 | — | — | US | claimed |
| CN-110607103-B | Anti-doodling transparent flame-retardant coating and preparation method thereof | 苏州群鹰防腐材料有限公司 | 2021-04-02 | — | — | CN | claimed |
| CN-110607103-A | Anti-doodling transparent flame-retardant coating and preparation method thereof | 苏州群鹰防腐材料有限公司 | 2019-12-24 | — | — | CN | claimed |
| US-9711455-B2 | Method of forming an air gap semiconductor structure with selective cap bilayer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-07-18 | — | — | US | claimed |
| US-20160133508-A1 | AIR GAP STRUCTURE WITH BILAYER SELECTIVE CAP | ADEIA SEMICONDUCTOR SOLUTIONS LLC | 2016-05-12 | — | — | US | claimed |
| US-9105642-B2 | Interlevel dielectric stack for interconnect structures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-08-11 | — | — | US | claimed |
| US-20140256154-A1 | INTERLEVEL DIELECTRIC STACK FOR INTERCONNECT STRUCTURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-11 | — | — | US | claimed |
| US-20130260575-A1 | SILICON PRECURSORS AND COMPOSITIONS COMPRISING SAME FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-03 | — | — | US | claimed |
| US-20130175697-A1 | Interlevel Dielectric Stack for Interconnect Structures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-11 | — | — | US | claimed |
| US-8357608-B2 | Multi component dielectric layer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-22 | — | — | US | claimed |
| US-20120032311-A1 | MULTI COMPONENT DIELECTRIC LAYER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-02-09 | — | — | US | claimed |
| WO-2011106218-A2 | ULTRA LOW DIELECTRIC MATERIALS USING HYBRID PRECURSORS CONTAINING SILICON WITH ORGANIC FUNCTIONAL GROUPS BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2011-09-01 | — | — | WO | claimed |
| US-20110206857-A1 | ULTRA LOW DIELECTRIC MATERIALS USING HYBRID PRECURSORS CONTAINING SILICON WITH ORGANIC FUNCTIONAL GROUPS BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2011-08-25 | — | — | US | claimed |
| US-20080009141-A1 | Methods to form SiCOH or SiCNH dielectrics and structures including the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-01-10 | — | — | US | claimed |
| US-7189664-B2 | Method for producing hydrogenated silicon-oxycarbide films | DOW CORNING CORPORATION (US) | 2007-03-13 | — | — | US | claimed |
| US-20060148252-A1 | Method for producing hydrogenated silicon-oxycarbide films | DOW CORNING CORPORATION | 2006-07-06 | — | — | US | claimed |
| WO-2004077543-A1 | METHOD FOR PRODUCING HYDROGENATED SILICON OXYCARBIDE FILMS | DOW CORNING CORPORATION (US) | 2004-09-10 | — | — | WO | claimed |