⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23974056 | 0.90 | ATM (0.33) | — | |
| SCHEMBL775899 | 0.87 | — | — | |
| SCHEMBL19246056 | 0.82 | ALDH1A1 (0.33) | — | |
| SCHEMBL18457348 | 0.82 | ALDH1A1 (0.33) | — | |
| SCHEMBL876911 | 0.81 | — | — | |
| SCHEMBL445380 | 0.81 | — | — | |
| SCHEMBL19273362 | 0.81 | — | — | |
| SCHEMBL14556977 | 0.80 | — | — | |
| SCHEMBL12671415 | 0.79 | — | — | |
| SCHEMBL14559653 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20210317065-A1 | Method for Purifying Polymerizable Fluoromonomer by Distillation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2021-10-14 | — | — | US | disclosed |
| EP-2420891-B1 | Process for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2021-06-23 | — | — | EP | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| EP-1720072-B1 | Compositons and processes for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2019-06-05 | — | — | EP | disclosed |
| US-9678426-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9678425-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9604891-B2 | Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9507258-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-29 | — | — | US | disclosed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | disclosed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | disclosed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | disclosed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-20070105044-A1 | Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-05-10 | — | — | US | disclosed |
| EP-1720072-A1 | Compositons and processes for immersion lithography | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-11-08 | — | — | EP | disclosed |
| US-20060246373-A1 | Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-11-02 | — | — | US | disclosed |
| US-20050131248-A1 | Process for producing alpha-substituted acrylic norbornanyyl compounds | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-06-16 | — | — | US | disclosed |