SCHEMBL526122

SCHEMBL526122

C=CC(O)C=Cc1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
TSHR P16473 1/20 0.48
CYP3A4 P08684 1/20 0.46
CYP1A2 P05177 2/20 0.46
MAOB P27338 1/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
LMNA P02545 2/20 0.40
MAPT P10636 2/20 0.40
HDAC3 O15379 1/20 0.40
TNKS O95271 1/20 0.40
HDAC4 P56524 1/20 0.40
HDAC1 Q13547 1/20 0.40
HCAR2 Q8TDS4 1/20 0.40
HDAC7 Q8WUI4 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC10 Q969S8 1/20 0.40
HDAC11 Q96DB2 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
TNKS2 Q9H2K2 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13759882 1.00 ALDH1A1 (0.48) ALDH1A1TSHRCYP3A4CYP1A2MAOB
SCHEMBL7593075 0.86 CYP1A2 (0.52) ALDH1A1TSHRCYP3A4CYP1A2MAOB
SCHEMBL7593078 0.86 CYP1A2 (0.52) ALDH1A1TSHRCYP3A4CYP1A2MAOB
SCHEMBL8976847 0.79 HSD11B1 (0.44) CYP3A4CYP2C9TRPA1
SCHEMBL8976851 0.79 HSD11B1 (0.44) CYP3A4CYP2C9TRPA1
SCHEMBL155214 0.78 CYP1A2 (0.50) ALDH1A1CYP3A4CYP1A2MAOBLMNA
SCHEMBL1904233 0.78 CYP1A2 (0.55) ALDH1A1TSHRCYP3A4CYP1A2MAOB
SCHEMBL7038776 0.77 ALDH1A1 (0.52) ALDH1A1TSHRCYP3A4CYP1A2MAOB
SCHEMBL6837422 0.77 CYP1A2 (0.48) ALDH1A1TSHRCYP3A4CYP1A2MAOB
SCHEMBL5958250 0.77 CYP3A4 (0.48) ALDH1A1TSHRCYP3A4CYP1A2MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240191129-A1 WATER-BASED FRICTION-REDUCING SLURRY COMPOSITIONS, FORMATION TREATING FLUIDS THEREFROM, AND METHOD FOR MAKING AND USING SAME PfP Industries LLC (US) 2024-06-13 US claimed
US-20240010774-A1 SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF SUNRESIN NEW MATERIALS CO. LTD. (CN) 2024-01-11 US claimed
US-20230312859-A1 POROUS RESIN USED TO SOLID PHASE SYNTHESSIS AND PREPARATION METHOD THEREFOR SUNRESIN NEW MATERIALS CO. LTD. (CN) 2023-10-05 US claimed
EP-4190825-A1 SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF Sunresin New Materials Co. Ltd., Xi'an (CN) 2023-06-07 EP claimed
EP-4177281-A1 POROUS RESIN USED TO SOLID PHASE SYNTHESIS AND PREPARATION METHOD THEREFOR Sunresin New Materials Co. Ltd., Xi'an (CN) 2023-05-10 EP claimed
US-20240010774-A1 SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF SUNRESIN NEW MATERIALS CO. LTD. (CN) 2024-01-11 US disclosed
US-20230312859-A1 POROUS RESIN USED TO SOLID PHASE SYNTHESSIS AND PREPARATION METHOD THEREFOR SUNRESIN NEW MATERIALS CO. LTD. (CN) 2023-10-05 US disclosed
EP-4190825-A1 SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF Sunresin New Materials Co. Ltd., Xi'an (CN) 2023-06-07 EP disclosed
EP-4177281-A1 POROUS RESIN USED TO SOLID PHASE SYNTHESIS AND PREPARATION METHOD THEREFOR Sunresin New Materials Co. Ltd., Xi'an (CN) 2023-05-10 EP disclosed
CN-114539459-A Solid-phase synthesis carrier and preparation method and application thereof 西安蓝晓科技新材料股份有限公司 2022-05-27 CN disclosed
CN-114539458-A Porous resin applied to solid phase synthesis and preparation method thereof 西安蓝晓科技新材料股份有限公司 2022-05-27 CN disclosed
CN-101965368-B Ethylene-based polymer compositions, methods of making the same, and articles made therefrom DOW GLOBAL TECHNOLOGIES INC 2014-08-27 CN disclosed
US-5717014-A BLENDED WITH PARTIALLY HYDROGENATED AROMATIC ALKENYL COMPOUND-CONJUGATED DIENE BLOCK POLYMER HAVING HYDROXYL GROUP, THERMOPLASTIC RESIN AND A PHOSPHOROUS ACID TRIESTER; IMPACT STRENGTH, RIGIDITY, HEAT RESISTANCE MITSUBISHI CHEMICAL CORPORATION (JP) 1998-02-10 US disclosed
EP-0765914-A1 POLYPHENYLENE ETHER RESIN COMPOSITION MITSUBISHI CHEMICAL CORPORATION (JP) 1997-04-02 EP disclosed
US-4894279-A Wear resistant layer composed of polymer modified by organotitanium compound INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1990-01-16 US disclosed
EP-0147642-B1 ELECTROEROSION PRINT MEDIA HAVING A PROTECTIVE COATING International Business Machines Corporation (US) 1989-02-01 EP disclosed
EP-0147643-B1 ELECTROEROSION PRINTING International Business Machines Corporation (US) 1989-01-25 EP disclosed
US-4554562-A Scratch resistant recording materials for electroerosion printing not requiring a lubricant overcoat INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1985-11-19 US disclosed
EP-0147642-A2 Electroerosion print media having a protective coating International Business Machines Corporation (US) 1985-07-10 EP disclosed
EP-0147643-A2 Electroerosion printing International Business Machines Corporation (US) 1985-07-10 EP disclosed