Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PAM | P19021 | 1/20 | 0.54 |
| ▸ | MAOB | P27338 | 2/20 | 0.48 |
| ▸ | IDO1 | P14902 | 2/20 | 0.48 |
| ▸ | CA1 | P00915 | 1/20 | 0.48 |
| ▸ | HTR2A | P28223 | 3/20 | 0.45 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.44 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.43 |
| ▸ | HDAC4 | P56524 | 2/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.43 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.43 |
| ▸ | TNKS | O95271 | 1/20 | 0.43 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.43 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.43 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.43 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.43 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.43 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.43 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9777486 | 0.87 | IDO1 (0.58) | PAMMAOBIDO1HTR2ANFE2L2 | |
| SCHEMBL4863423 | 0.87 | IDO1 (0.58) | PAMMAOBIDO1HTR2ANFE2L2 | |
| Perchlorate SCHEMBL10613185 | 0.79 | PAM (0.52) | PAMMAOBIDO1CA1HTR2A | |
| SCHEMBL9437998 | 0.77 | HDAC3 (0.68) | PAMMAOBCA1HDAC3HDAC4 | |
| SCHEMBL2802853 | 0.77 | HDAC3 (0.68) | PAMMAOBCA1HDAC3HDAC4 | |
| SCHEMBL19284235 | 0.77 | IDO1 (0.54) | PAMMAOBIDO1HTR2ANFE2L2 | |
| SCHEMBL29030882 | 0.77 | IDO1 (0.54) | PAMMAOBIDO1HTR2ANFE2L2 | |
| SCHEMBL2777416 | 0.76 | — | — | |
| SCHEMBL28759603 | 0.76 | MAOB (0.58) | PAMMAOBCA1NFE2L2HDAC3 | |
| SCHEMBL20077 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240191129-A1 | WATER-BASED FRICTION-REDUCING SLURRY COMPOSITIONS, FORMATION TREATING FLUIDS THEREFROM, AND METHOD FOR MAKING AND USING SAME | PfP Industries LLC (US) | 2024-06-13 | — | — | US | claimed |
| US-20240010774-A1 | SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF | SUNRESIN NEW MATERIALS CO. LTD. (CN) | 2024-01-11 | — | — | US | claimed |
| US-20230312859-A1 | POROUS RESIN USED TO SOLID PHASE SYNTHESSIS AND PREPARATION METHOD THEREFOR | SUNRESIN NEW MATERIALS CO. LTD. (CN) | 2023-10-05 | — | — | US | claimed |
| EP-4190825-A1 | SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF | Sunresin New Materials Co. Ltd., Xi'an (CN) | 2023-06-07 | — | — | EP | claimed |
| EP-4177281-A1 | POROUS RESIN USED TO SOLID PHASE SYNTHESIS AND PREPARATION METHOD THEREFOR | Sunresin New Materials Co. Ltd., Xi'an (CN) | 2023-05-10 | — | — | EP | claimed |
| US-8802745-B2 | Porous resin bead and method for producing nucleic acid using the same | NITTO DENKO CORPORATION (JP) | 2014-08-12 | — | — | US | claimed |
| US-8653152-B2 | Porous resin bead and method for producing nucleic acid using the same | NITTO DENKO CORPORATION (JP) | 2014-02-18 | — | — | US | claimed |
| JP-9255730-A | — | — | None | — | — | JP | disclosed |
| US-20240010774-A1 | SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF | SUNRESIN NEW MATERIALS CO. LTD. (CN) | 2024-01-11 | — | — | US | disclosed |
| US-20230312859-A1 | POROUS RESIN USED TO SOLID PHASE SYNTHESSIS AND PREPARATION METHOD THEREFOR | SUNRESIN NEW MATERIALS CO. LTD. (CN) | 2023-10-05 | — | — | US | disclosed |
| EP-4190825-A1 | SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF | Sunresin New Materials Co. Ltd., Xi'an (CN) | 2023-06-07 | — | — | EP | disclosed |
| EP-4177281-A1 | POROUS RESIN USED TO SOLID PHASE SYNTHESIS AND PREPARATION METHOD THEREFOR | Sunresin New Materials Co. Ltd., Xi'an (CN) | 2023-05-10 | — | — | EP | disclosed |
| CN-114539459-A | Solid-phase synthesis carrier and preparation method and application thereof | 西安蓝晓科技新材料股份有限公司 | 2022-05-27 | — | — | CN | disclosed |
| US-5145880-A | LIQUID, REACTIVE COMPOSITIONS ENDOWED WITH HIGH POLYMERIZATION SPEED, CONTAINING POLYISOCYANATES AND COMPOUNDS WITH ONE OR MORE EPOXY GROUPS | ENICHEM S.P.A. (IT) | 1992-09-08 | — | — | US | disclosed |
| EP-0454207-A1 | Liquid, reactive compositions endowed with high polymerization speed, containing polyisocyanates and compounds with one or more epoxy groups | ENICHEM S.p.A. (IT) | 1991-10-30 | — | — | EP | disclosed |
| US-5019494-A | Hydrophilic Colloid, Dextran, Ionic Polymer | FUJI PHOTO FILM CO., LTD. (JP) | 1991-05-28 | — | — | US | disclosed |
| US-5015562-A | Light-sensitive silver halide element containing modant, dye and sonic polymer | FUJI PHOTO FILM CO., LTD. (JP) | 1991-05-14 | — | — | US | disclosed |
| US-4720345-A | Semipermeable membranes of modified styrene-based polymers, process for their manufacture and their use | ALIGENA AG (CH) | 1988-01-19 | — | — | US | disclosed |
| US-4438245-A | FOR LIGHT SENSITIVE ELEMENTS | FUJI PHOTO FILM CO., LTD. (JP) | 1984-03-20 | — | — | US | disclosed |
| US-3945831-A | Photosensitive resins containing a thienylacrylic acid ester or amide group | FUJI PHOTO FILM CO., LTD. (JA) | 1976-03-23 | — | — | US | disclosed |