SCHEMBL526346

SCHEMBL526346

NCCN(CCO)CC(=O)O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BLM P54132 3/20 0.54
TSHR P16473 3/20 0.54
TDP1 Q9NUW8 2/20 0.54
KDM4E B2RXH2 2/20 0.54
ALOX15 P16050 2/20 0.54
PMP22 Q01453 2/20 0.54
LMNA P02545 2/20 0.54
CHRM2 P08172 1/20 0.54
ADRA2A P08913 1/20 0.54
DRD1 P21728 1/20 0.54
SLC6A2 P23975 1/20 0.54
SLC6A4 P31645 1/20 0.54
CYP2C19 P33261 1/20 0.54
ADRA1A P35348 1/20 0.54
DRD3 P35462 1/20 0.54
SLC6A3 Q01959 1/20 0.54
HRH3 Q9Y5N1 1/20 0.54
EYA2 O00167 1/20 0.50
APP P05067 1/20 0.50
ACE P12821 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2153152 0.98 BLM (0.52) BLMTSHRTDP1KDM4EALOX15
SCHEMBL2153100 0.98 TDP1 (0.52) BLMTSHRTDP1KDM4EALOX15
Nitrilotriacetic Acid SCHEMBL21296993 0.93 TDP1 (0.54) BLMTSHRTDP1KDM4EALOX15
SCHEMBL676801 0.91 BLM (0.65) BLMTSHRTDP1KDM4EALOX15
Bicine SCHEMBL867955 0.88 TDP1 (0.56) BLMTSHRTDP1KDM4EALOX15
Hydrochloric Acid SCHEMBL9406491 0.88 BLM (0.62) BLMTSHRTDP1KDM4EALOX15
Bicine SCHEMBL177696 0.88 ALOX15 (0.68) BLMTSHRTDP1KDM4EALOX15
Bicine SCHEMBL34161 0.88 ALOX15 (0.68) BLMTSHRTDP1KDM4EALOX15
SCHEMBL3416374 0.86 TDP1 (0.75) BLMTSHRTDP1KDM4EALOX15
Bicine SCHEMBL5883443 0.85 ALOX15 (0.65) BLMTSHRTDP1KDM4EALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111495958-A Contaminated soil remediation method 中国科学院过程工程研究所 2020-08-07 CN claimed
EP-3402574-A1 PERSONAL CARE COMPOSITIONS Colgate-Palmolive Company (US) 2018-11-21 EP claimed
US-20170239155-A1 PERSONAL CARE COMPOSITIONS COLGATE PALMOLIVE CO (US) 2017-08-24 US claimed
WO-2017142626-A1 PERSONAL CARE COMPOSITIONS COLGATE-PALMOLIVE COMPANY (US) 2017-08-24 WO claimed
JP-3153798-A None JP disclosed
JP-55009645-A None JP disclosed
EP-3402574-B1 PERSONAL CARE COMPOSITIONS COLGATE PALMOLIVE CO (US) 2026-02-04 EP disclosed
CN-118382423-A Personal care compositions 高露洁-棕榄公司 2024-07-23 CN disclosed
EP-4392005-A1 PERSONAL CARE COMPOSITIONS Colgate-Palmolive Company (US) 2024-07-03 EP disclosed
CN-117917989-A Use of a reversible metal electrodeposited electrolyte with pH-adjustable, dynamic glass element with high opacity and excellent rest stability, and electrolyte useful therefor 代表内华达大学雷诺分校的内华达高等教育系统董事会 2024-04-23 CN disclosed
WO-2023107659-A1 PERSONAL CARE COMPOSITIONS COLGATE-PALMOLIVE COMPANY (US) 2023-06-15 WO disclosed
US-20230181445-A1 Personal Care Compositions COLGATE-PALMOLIVE COMPANY (US) 2023-06-15 US disclosed
EP-0834769-A1 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer FUJI PHOTO FILM CO., LTD. (JP) 1998-04-08 EP disclosed
EP-0831374-A1 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer FUJI PHOTO FILM CO., LTD. (JP) 1998-03-25 EP disclosed
US-5578642-A ESTERIFICATION OF AZELAIC ACID WITH A FATTY ALCOHOL HENKEL CORPORATION (US) 1996-11-26 US disclosed
US-5554482-A COATING STABILITY; ANTIAGGLOMERANTS FUJI PHOTO FILM CO., LTD. (JP) 1996-09-10 US disclosed
EP-0514934-B1 Optically clear hair care compositions containing silicone based microemulsions DOW CORNING (US) 1996-04-10 EP disclosed
EP-0664487-A1 Silver halide light-sensitive material comprising light-sensitive polymerizable layer and an overcoating layer containing polyvinyl alcohol with acidic groups or a salt thereof FUJI PHOTO FILM CO., LTD. (JP) 1995-07-26 EP disclosed
JP-H03153798-A LOWLY IRRITANT DETERGENT COMPOSITION KAO CORP 1991-07-01 JP disclosed
JP-S559645-A PREPARATION OF A SOLUTION FOR ROUGHENING THE SURFACE OF HIGH MOLECULAR WEIGHT MATERIAL MATSUSHITA ELECTRIC IND CO LTD 1980-01-23 JP disclosed