Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.63 |
| ▸ | HTT | P42858 | 2/20 | 0.63 |
| ▸ | THRB | P10828 | 1/20 | 0.63 |
| ▸ | MAPT | P10636 | 1/20 | 0.63 |
| ▸ | USP2 | O75604 | 2/20 | 0.51 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | LPAR1 | Q92633 | 4/20 | 0.43 |
| ▸ | LPAR3 | Q9UBY5 | 4/20 | 0.43 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.43 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.41 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.41 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5265746 | 1.00 | MEN1 (0.63) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL6269869 | 0.98 | MEN1 (0.60) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL2730257 | 0.96 | HTT (0.57) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL5267993 | 0.96 | HTT (0.57) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL11436367 | 0.95 | HTT (0.53) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL11436017 | 0.93 | TSHR (0.57) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL6544683 | 0.93 | TSHR (0.57) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL1575700 | 0.93 | TSHR (0.57) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL212883 | 0.93 | TSHR (0.57) | MEN1KMT2AHTTTHRBMAPT | |
| SCHEMBL472216 | 0.89 | TSHR (0.56) | MEN1KMT2AHTTTHRBMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240118612-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RESIST PATTERN FILM, AND METHOD FOR MANUFACTURING PLATED SHAPED ARTICLE | JSR CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| JP-2022053156-A | COSMETICS CONTAINING CERAMIDE-CONTAINING NIOSOME | 株式会社ファンケル | 2022-04-05 | — | — | JP | disclosed |
| US-20210311391-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PLATED FORMED BODY, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2021-10-07 | — | — | US | disclosed |
| WO-2020039755-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PLATED FORMED BODY, AND SEMICONDUCTOR DEVICE | JSR株式会社 | 2020-02-27 | — | — | WO | disclosed |
| US-10415011-B2 | Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition | JSR CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| EP-3040411-B1 | ADHEREND RECOVERY METHOD AND ADHEREND RECOVERY DEVICE | JSR CORP (JP) | 2019-07-03 | — | — | EP | disclosed |
| US-10095110-B2 | Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern | JSR CORPORATION (JP) | 2018-10-09 | — | — | US | disclosed |
| US-20170153543-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING METALLIC PATTERN | JSR CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| US-20170127533-A1 | PRODUCTION PROCESS FOR SOLDER ELECTRODE, PRODUCTION PROCESS FOR LAMINATE, LAMINATE AND ELECTRONIC PART | JSR CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| EP-3040411-A1 | ADHEREND RECOVERY METHOD, ADHEREND RECOVERY DEVICE, GAS GENERATION MEMBRANE, AND RESIN COMPOSITION | JSR Corporation (JP) | 2016-07-06 | — | — | EP | disclosed |
| US-20160168532-A1 | ADHEREND RECOVERY METHOD, ADHEREND RECOVERY APPARATUS, GAS-GENERATING FILM AND RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| EP-1840654-B1 | Radiation-sensitive negative resin composition | JSR CORP (JP) | 2013-03-20 | — | — | EP | disclosed |
| EP-1840654-A1 | Radiation-sensitive negative resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | disclosed |