⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Lindane SCHEMBL9815928 | 0.80 | LMNA (0.36) | — | |
| SCHEMBL1070853 | 0.67 | — | — | |
| SCHEMBL21933252 | 0.63 | — | — | |
| Butane SCHEMBL3895285 | 0.63 | — | — | |
| SCHEMBL8385848 | 0.59 | — | — | |
| SCHEMBL208611 | 0.59 | — | — | |
| SCHEMBL49670 | 0.59 | — | — | |
| Propane SCHEMBL23701103 | 0.56 | — | — | |
| Bromide SCHEMBL5819633 | 0.56 | — | — | |
| SCHEMBL21357940 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4128328-B1 | METHOD FOR MANUFACTURING A COMPOSITE STRUCTURE COMPRISING A THIN LAYER MADE OF MONOCRYSTALLINE SIC ON A CARRIER SUBSTRATE MADE OF SIC | SOITEC SILICON ON INSULATOR (FR) | 2024-04-03 | — | — | EP | claimed |
| EP-4066275-B1 | METHOD FOR MANUFACTURING A COMPOSITE STRUCTURE COMPRISING A THIN LAYER OF MONOCRYSTALLINE SIC ON AN SIC CARRIER SUBSTRATE | SOITEC SILICON ON INSULATOR (FR) | 2023-12-27 | — | — | EP | claimed |
| CN-108623558-A | A kind of synthetic method of 2- (the bromo- 2- luorobenzyls of 5-) benzothiophene | 瑞孚信江苏药业股份有限公司 | 2018-10-09 | — | — | CN | claimed |
| CN-105324842-A | Hybrid barrier layer for substrates and electronic devices | UNIVERSAL DISPLAY CORP | 2016-02-10 | — | — | CN | claimed |
| CN-1698188-B | Method for depositing a low dielectric constant film | APPLIED MATERIALS INC | 2010-09-08 | — | — | CN | claimed |
| CN-101553599-A | Multilayered coatings for use on electronic devices or other articles | UNIV PRINCETON (US) | 2009-10-07 | — | — | CN | claimed |
| CN-1698188-A | Method for depositing a low dielectric constant film | APPLIED MATERIALS INC (US) | 2005-11-16 | — | — | CN | claimed |
| US-4183819-A | INORGANIC OXIDE POWDERS, ALKYL SILANES, ALKALINE EARTH METAL CARBONATES AND A FATTY ACID | STOLOVE SOLOMON | 1980-01-15 | — | — | US | claimed |
| US-12217959-B2 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Kokusai Electric Corporation (JP) | 2025-02-04 | — | — | US | disclosed |
| CN-118834057-A | High-temperature-resistant material coated aerogel heat-insulating composite material and preparation method thereof | 台湾气凝胶科技材料开发股份有限公司 | 2024-10-25 | — | — | CN | disclosed |
| EP-4431645-A1 | METHOD FOR PRODUCING HETEROEPITAXIAL WAFER | Shin-Etsu Handotai Co., Ltd. (JP) | 2024-09-18 | — | — | EP | disclosed |
| CN-108475624-B | Method for manufacturing semiconductor device, substrate processing apparatus, and recording medium | 株式会社国际电气 | 2023-10-20 | — | — | CN | disclosed |
| CN-109476918-B | Elastomer composition and use thereof | 美国陶氏有机硅公司 | 2021-12-31 | — | — | CN | disclosed |
| US-10985013-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2021-04-20 | — | — | US | disclosed |
| EP-0630933-A2 | A method of producing a semiconducting material | NIPPON OIL CO. LTD. (JP) | 1994-12-28 | — | — | EP | disclosed |
| US-5304622-A | Process for producing polysilanes | NIPPON OIL COMPANY, LTD. (JP) | 1994-04-19 | — | — | US | disclosed |
| EP-0551771-A2 | Process for producing polysilanes | NIPPON OIL CO. LTD. (JP) | 1993-07-21 | — | — | EP | disclosed |
| WO-1993007844-A1 | HIGH TEMPERATURE RESISTANT IDENTIFYING LABELS | W.H. BRADY CO. (US) | 1993-04-29 | — | — | WO | disclosed |
| EP-0241739-A1 | Method of modifying surfaces and application of the method in forming layered structures | International Business Machines Corporation (US) | 1987-10-21 | — | — | EP | disclosed |
| EP-0019674-B1 | PROCESS FOR THE PRODUCTION OF A HOLLOW CATALYST CARRIER MADE OF TRANSITION-ALUMINA | Sumitomo Aluminium Smelting Company Limited (JP) | 1984-07-25 | — | — | EP | disclosed |