SCHEMBL5315655

SCHEMBL5315655

[BaH2].[BaH2].[Nb+5].[Nb+5].[O-2].[O-2].[O-2].[O-2].[O-2].[SrH2].[SrH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8178400 0.87
SCHEMBL8428836 0.75
SCHEMBL5357990 0.75
SCHEMBL7032532 0.75
SCHEMBL1225124 0.75
SCHEMBL7156558 0.75
SCHEMBL3938862 0.75
SCHEMBL9590939 0.75
SCHEMBL986829 0.75
SCHEMBL5947139 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070097323-A1 Electro-optical wobulator HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2007-05-03 US claimed
JP-2000504882-A 2000-04-18 JP claimed
US-5888585-A APPLYING A LIQUID PRECURSOR CONTAINING BARIUM, STRONTIUM, AND NIOBIUM, TREATING BY BAKING, ANNEALING, OR EXPOSING TO VACUUM TO FORM THE NON-FERROELECTRIC OXIDE; MEMORY CELL CAPACITORS SYMETRIX CORPORATION (US) 1999-03-30 US claimed
EP-0880800-A1 HIGH DIELECTRIC CONSTANT BARIUM-STRONTIUM-NIOBIUM OXIDES FOR INTEGRATED CIRCUIT APPLICATIONS SYMETRIX CORPORATION (US) 1998-12-02 EP claimed
WO-1997029511-A1 HIGH DIELECTRIC CONSTANT BARIUM-STRONTIUM-NIOBIUM OXIDES FOR INTEGRATED CIRCUIT APPLICATIONS SYMETRIX CORPORATION (US) 1997-08-14 WO claimed
WO-2007053218-A1 ELECTRO-OPTICAL WOBULATOR HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2007-05-10 WO disclosed
US-20070097323-A1 Electro-optical wobulator HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2007-05-03 US disclosed
US-5888585-A APPLYING A LIQUID PRECURSOR CONTAINING BARIUM, STRONTIUM, AND NIOBIUM, TREATING BY BAKING, ANNEALING, OR EXPOSING TO VACUUM TO FORM THE NON-FERROELECTRIC OXIDE; MEMORY CELL CAPACITORS SYMETRIX CORPORATION (US) 1999-03-30 US disclosed
US-5888585-A APPLYING A LIQUID PRECURSOR CONTAINING BARIUM, STRONTIUM, AND NIOBIUM, TREATING BY BAKING, ANNEALING, OR EXPOSING TO VACUUM TO FORM THE NON-FERROELECTRIC OXIDE; MEMORY CELL CAPACITORS SYMETRIX CORPORATION (US) 1999-03-30 US disclosed
US-5888585-A APPLYING A LIQUID PRECURSOR CONTAINING BARIUM, STRONTIUM, AND NIOBIUM, TREATING BY BAKING, ANNEALING, OR EXPOSING TO VACUUM TO FORM THE NON-FERROELECTRIC OXIDE; MEMORY CELL CAPACITORS SYMETRIX CORPORATION (US) 1999-03-30 US disclosed
EP-0880800-A1 HIGH DIELECTRIC CONSTANT BARIUM-STRONTIUM-NIOBIUM OXIDES FOR INTEGRATED CIRCUIT APPLICATIONS SYMETRIX CORPORATION (US) 1998-12-02 EP disclosed
EP-0880800-A1 HIGH DIELECTRIC CONSTANT BARIUM-STRONTIUM-NIOBIUM OXIDES FOR INTEGRATED CIRCUIT APPLICATIONS SYMETRIX CORPORATION (US) 1998-12-02 EP disclosed
US-5751034-A High dielectric constant barium-strontium-niobium oxides for integrated circuit applications SYMETRIX CORPORATION (US) 1998-05-12 US disclosed
US-5751034-A High dielectric constant barium-strontium-niobium oxides for integrated circuit applications SYMETRIX CORPORATION (US) 1998-05-12 US disclosed
US-5751034-A High dielectric constant barium-strontium-niobium oxides for integrated circuit applications SYMETRIX CORPORATION (US) 1998-05-12 US disclosed
WO-1997029511-A1 HIGH DIELECTRIC CONSTANT BARIUM-STRONTIUM-NIOBIUM OXIDES FOR INTEGRATED CIRCUIT APPLICATIONS SYMETRIX CORPORATION (US) 1997-08-14 WO disclosed
WO-1997029511-A1 HIGH DIELECTRIC CONSTANT BARIUM-STRONTIUM-NIOBIUM OXIDES FOR INTEGRATED CIRCUIT APPLICATIONS SYMETRIX CORPORATION (US) 1997-08-14 WO disclosed