SCHEMBL5320232

SCHEMBL5320232

Nc1cccc(-c2cc(N)cc(C(F)(F)F)c2C(F)(F)F)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.47
GLA P06280 1/20 0.47
POLB P06746 1/20 0.47
GAA P10253 1/20 0.47
MAPK1 P28482 1/20 0.43
MAOA P21397 1/20 0.41
MAP4K4 O95819 3/20 0.40
PDE3B Q13370 1/20 0.39
PDE3A Q14432 1/20 0.39
MECP2 P51608 1/20 0.37
RORC P51449 1/20 0.36
RORB Q92753 1/20 0.36
CYP3A4 P08684 1/20 0.35
CASP1 P29466 1/20 0.35
RECQL P46063 1/20 0.35
PTGS1 P23219 1/20 0.35
SYK P43405 1/20 0.35
MEN1 O00255 1/20 0.35
PSIP1 O75475 1/20 0.35
AXL P30530 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29463898 1.00 TSHR (0.47) TSHRGLAPOLBGAAMAPK1
SCHEMBL28686237 0.85 MAP4K4 (0.45) TSHRGLAPOLBGAAMAPK1
SCHEMBL672246 0.81 TSHR (0.52) TSHRGLAPOLBGAAMAPK1
SCHEMBL3804592 0.81 TSHR (0.68) TSHRGLAPOLBGAAMAPK1
SCHEMBL3398486 0.77 SCN9A (0.53) TSHRGLAPOLBGAAMAPK1
SCHEMBL3785346 0.76 MAP4K4 (0.46) TSHRGLAPOLBGAAMAPK1
SCHEMBL3783934 0.76 MAP4K4 (0.46) TSHRGLAPOLBGAAMAPK1
SCHEMBL30648132 0.75 TSHR (0.44) TSHRGLAPOLBGAAMAPK1
SCHEMBL28912663 0.74 TSHR (0.53) TSHRGLAPOLBGAAMAPK1
SCHEMBL28548702 0.74 TSHR (0.53) TSHRGLAPOLBGAAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117430812-B Photosensitive polyamic acid ester resin, resin composition and application 明士(北京)新材料开发有限公司 2024-03-19 CN claimed
CN-117430812-A Photosensitive polyamic acid ester resin, resin composition and application 明士(北京)新材料开发有限公司 2024-01-23 CN claimed
CN-114591535-B Recovery method of nano-cluster crosslinked organic-inorganic hybrid crosslinked polymer 北京化工大学 2022-12-09 CN claimed
CN-117430812-B Photosensitive polyamic acid ester resin, resin composition and application 明士(北京)新材料开发有限公司 2024-03-19 CN disclosed
CN-117430812-A Photosensitive polyamic acid ester resin, resin composition and application 明士(北京)新材料开发有限公司 2024-01-23 CN disclosed
CN-117203264-A Polyimide precursor composition and polyimide 杰富意化学株式会社 2023-12-08 CN disclosed
CN-114249906-B Transparent polyimide film and preparation method and application thereof 北京化工大学 2023-05-12 CN disclosed
CN-114591535-B Recovery method of nano-cluster crosslinked organic-inorganic hybrid crosslinked polymer 北京化工大学 2022-12-09 CN disclosed
CN-114591535-A Recovery method of nano-cluster crosslinked organic-inorganic hybrid crosslinked polymer 北京化工大学 2022-06-07 CN disclosed
CN-114249906-A Transparent polyimide film and preparation method and application thereof 北京化工大学 2022-03-29 CN disclosed
CN-112175184-A Modified high-transparency polyimide flexible film and preparation method thereof 安徽省长荣新材料科技有限公司 2021-01-05 CN disclosed
WO-2007092011-A1 PHOTOSENSITIVE POLYIMIDE COMPOSITION AND POLYIMIDE PRECURSOR COMPOSITION CENTRAL GLASS CO., LTD. (JP) 2007-08-16 WO disclosed