Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 11/20 | 0.42 |
| ▸ | ESR1 | P03372 | 10/20 | 0.42 |
| ▸ | ESRRB | O95718 | 2/20 | 0.42 |
| ▸ | ESRRA | P11474 | 2/20 | 0.42 |
| ▸ | AR | P10275 | 2/20 | 0.39 |
| ▸ | CA9 | Q16790 | 2/20 | 0.38 |
| ▸ | MIF | P14174 | 1/20 | 0.38 |
| ▸ | TYR | P14679 | 1/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | CA3 | P07451 | 1/20 | 0.37 |
| ▸ | CA6 | P23280 | 1/20 | 0.37 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.37 |
| ▸ | TTR | P02766 | 1/20 | 0.36 |
| ▸ | AURKA | O14965 | 1/20 | 0.35 |
| ▸ | EGFR | P00533 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6561365 | 0.84 | ESR2 (0.39) | ESR2ESR1ESRRBESRRAAR | |
| SCHEMBL29955930 | 0.80 | ESR2 (0.42) | ESR2ESR1ESRRBESRRAAR | |
| SCHEMBL5613280 | 0.78 | RAD51 (0.40) | CA9CA12CA2CA3CA6 | |
| SCHEMBL31290788 | 0.78 | ALDH1A1 (0.40) | — | |
| SCHEMBL28163323 | 0.76 | HTR2A (0.39) | AR | |
| SCHEMBL23405836 | 0.75 | TRPV4 (0.30) | AR | |
| SCHEMBL29473510 | 0.73 | CA9 (0.46) | ESR2ESR1ESRRBESRRAAR | |
| SCHEMBL1697195 | 0.73 | CA9 (0.46) | ESR2ESR1ESRRBESRRAAR | |
| SCHEMBL162969 | 0.73 | MIF (0.58) | ESR2ESR1ESRRBESRRACA9 | |
| SCHEMBL31609339 | 0.73 | MIF (0.58) | ESR2ESR1ESRRBESRRACA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120136704-A | Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-120136703-A | Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2025-06-13 | — | — | CN | disclosed |
| WO-2007149449-A2 | PREPARATION OF FLUOROALKOXYSTYRENES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-12-27 | — | — | WO | disclosed |