Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC18A3 | Q16572 | 6/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.39 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.38 |
| ▸ | KMO | O15229 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | RAF1 | P04049 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | APEX1 | P27695 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL532780 | 0.91 | SMN1; SMN2 (0.42) | SLC18A3SIGMAR1CYP11B2CYP2D6KMO | |
| SCHEMBL29762350 | 0.89 | SLC18A3 (0.52) | SLC18A3SIGMAR1CYP11B2CYP2D6KMO | |
| SCHEMBL3455184 | 0.84 | S1PR1 (0.38) | SLC18A3SIGMAR1CYP11B2CYP2D6KMO | |
| SCHEMBL10807810 | 0.82 | CYP11B2 (0.47) | SLC18A3CYP11B2KMOSMN1; SMN2HAO1 | |
| Bromide SCHEMBL7708329 | 0.80 | CYP11B2 (0.45) | SLC18A3CYP11B2KMOSMN1; SMN2HAO1 | |
| SCHEMBL3129952 | 0.79 | SLC18A3 (0.39) | SLC18A3SIGMAR1CYP11B2CYP2D6KMO | |
| SCHEMBL790829 | 0.78 | SLC18A3 (0.63) | SLC18A3SIGMAR1CYP11B2CYP2D6KMO | |
| SCHEMBL19198566 | 0.78 | SLC18A3 (0.63) | SLC18A3SIGMAR1CYP11B2CYP2D6KMO | |
| SCHEMBL447032 | 0.78 | SLC18A3 (0.63) | SLC18A3SIGMAR1CYP11B2CYP2D6KMO | |
| SCHEMBL42833 | 0.78 | SLC18A3 (0.63) | SLC18A3SIGMAR1CYP11B2CYP2D6KMO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 206 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2021873-B1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK CO (US) | 2013-03-27 | — | — | EP | claimed |
| US-20110003123-A1 | SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES | KODAK GRAPHIC COMMUNICATIONS, GMBH (DE) | 2011-01-06 | — | — | US | claimed |
| WO-2009109579-A1 | SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES | EASTMAN KODAK COMPANY (US) | 2009-09-11 | — | — | WO | claimed |
| EP-2098367-A1 | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates | EASTMAN KODAK COMPANY (US) | 2009-09-09 | — | — | EP | claimed |
| US-7524614-B2 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY (US) | 2009-04-28 | — | — | US | claimed |
| EP-2021873-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2009-02-11 | — | — | EP | claimed |
| WO-2007139687-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-12-06 | — | — | WO | claimed |
| US-20070275322-A1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY | 2007-11-29 | — | — | US | claimed |
| US-12517430-B2 | Lithographic printing plate precursor | ECO3 BV (BE) | 2026-01-06 | — | — | US | disclosed |
| US-12487526-B2 | Lithographic printing plate precursor | ECO3 BV (BE) | 2025-12-02 | — | — | US | disclosed |
| US-12403686-B2 | Lithographic printing plate precursor | ECO3 BV (BE) | 2025-09-02 | — | — | US | disclosed |
| EP-4171958-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MAKING A PRINTING PLATE PRECURSOR AND METHOD FOR MAKING A PRINTING PLATE | ECO3 BV (BE) | 2025-08-13 | — | — | EP | disclosed |
| EP-3960455-B1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR, A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE PRECURSOR AND A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE | ECO3 BV (BE) | 2025-08-06 | — | — | EP | disclosed |
| EP-4171957-B1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR | ECO3 BV (BE) | 2025-02-12 | — | — | EP | disclosed |
| US-7332253-B1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY (US) | 2008-02-19 | — | — | US | disclosed |
| US-7326521-B1 | Method of imaging and developing negative-working elements | EASTMAN KODAK COMPANY (US) | 2008-02-05 | — | — | US | disclosed |
| WO-2008013766-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-01-31 | — | — | WO | disclosed |
| WO-2007139687-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-12-06 | — | — | WO | disclosed |
| US-20070275322-A1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY | 2007-11-29 | — | — | US | disclosed |
| US-20060269874-A1 | On-press developable negative-working imageable elements | KODAK POLYCHROME GRAPHICS LLC | 2006-11-30 | — | — | US | disclosed |