Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | TP53 | P04637 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | ATM | Q13315 | 1/20 | 0.42 |
| ▸ | SLC18A3 | Q16572 | 3/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | XBP1 | P17861 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.35 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.35 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.35 |
| ▸ | LIPE | Q05469 | 1/20 | 0.35 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.35 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL533348 | 0.91 | SLC18A3 (0.44) | SMN1; SMN2ALDH1A1SLC18A3NPC1TSHR | |
| SCHEMBL1417522 | 0.86 | LMNA (0.51) | SMN1; SMN2LMNATP53MAPTALDH1A1 | |
| SCHEMBL3455184 | 0.85 | S1PR1 (0.38) | SMN1; SMN2SLC18A3TSHRHTTTDP1 | |
| SCHEMBL532741 | 0.82 | DRD2 (0.36) | SMN1; SMN2LMNATP53MAPTALDH1A1 | |
| SCHEMBL29762350 | 0.81 | SLC18A3 (0.52) | SMN1; SMN2MAPTALDH1A1SLC18A3TSHR | |
| P-Xylene SCHEMBL27546052 | 0.81 | SLC18A3 (0.52) | SMN1; SMN2LMNATP53MAPTALDH1A1 | |
| Toluene SCHEMBL28184886 | 0.79 | SLC18A3 (0.53) | SMN1; SMN2LMNATP53MAPTALDH1A1 | |
| Toluene SCHEMBL27615025 | 0.77 | SLC18A3 (0.52) | SMN1; SMN2LMNATP53MAPTALDH1A1 | |
| SCHEMBL346325 | 0.77 | LMNA (0.59) | SMN1; SMN2LMNATP53MAPTALDH1A1 | |
| SCHEMBL8025878 | 0.77 | LMNA (0.59) | SMN1; SMN2LMNATP53MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 232 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2021873-B1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK CO (US) | 2013-03-27 | — | — | EP | claimed |
| US-20110003123-A1 | SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES | KODAK GRAPHIC COMMUNICATIONS, GMBH (DE) | 2011-01-06 | — | — | US | claimed |
| WO-2009109579-A1 | SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES | EASTMAN KODAK COMPANY (US) | 2009-09-11 | — | — | WO | claimed |
| EP-2098367-A1 | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates | EASTMAN KODAK COMPANY (US) | 2009-09-09 | — | — | EP | claimed |
| US-7524614-B2 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY (US) | 2009-04-28 | — | — | US | claimed |
| EP-2021873-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2009-02-11 | — | — | EP | claimed |
| WO-2007139687-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-12-06 | — | — | WO | claimed |
| US-20070275322-A1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY | 2007-11-29 | — | — | US | claimed |
| US-20230382100-A1 | A Lithographic Printing Plate Precursor | AGFA OFFSET BV (BE) | 2023-11-30 | — | — | US | disclosed |
| US-20230350291-A1 | A Lithographic Printing Plate Precursor | AGFA OFFSET BV (BE) | 2023-11-02 | — | — | US | disclosed |
| US-20230311474-A1 | A Lithographic Printing Plate Precursor | AGFA OFFSET BV (BE) | 2023-10-05 | — | — | US | disclosed |
| EP-3928983-B1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR | ECO3 BV (BE) | 2023-09-27 | — | — | EP | disclosed |
| US-20230266667-A1 | A Lithographic Printing Plate Precursor | AGFA OFFSET BV (BE) | 2023-08-24 | — | — | US | disclosed |
| EP-3793831-B1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA OFFSET BV (BE) | 2023-07-12 | — | — | EP | disclosed |
| US-7332253-B1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY (US) | 2008-02-19 | — | — | US | disclosed |
| US-7326521-B1 | Method of imaging and developing negative-working elements | EASTMAN KODAK COMPANY (US) | 2008-02-05 | — | — | US | disclosed |
| WO-2008013766-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-01-31 | — | — | WO | disclosed |
| WO-2007139687-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-12-06 | — | — | WO | disclosed |
| US-20070275322-A1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY | 2007-11-29 | — | — | US | disclosed |
| US-20060269874-A1 | On-press developable negative-working imageable elements | KODAK POLYCHROME GRAPHICS LLC | 2006-11-30 | — | — | US | disclosed |