Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 1/20 | 0.37 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.34 |
| ▸ | KIF11 | P52732 | 2/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | ACACB | O00763 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19025 | 0.86 | SLC6A2 (0.34) | RIPK1SLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL198046 | 0.86 | RIPK1 (0.43) | RIPK1SLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL27649737 | 0.84 | SLC6A2 (0.33) | RIPK1SLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL19339946 | 0.79 | MAPT (0.40) | RIPK1SLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL533272 | 0.79 | KDM4E (0.38) | KIF11KDM4EMEN1ALDH1A1KMT2A | |
| SCHEMBL27876450 | 0.78 | SLC6A2 (0.31) | SLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL533165 | 0.78 | — | — | |
| SCHEMBL533257 | 0.78 | KIF11 (0.47) | KIF11 | |
| SCHEMBL6573034 | 0.78 | KIF11 (0.47) | KIF11 | |
| SCHEMBL26746 | 0.78 | SLC6A2 (0.44) | RIPK1SLC6A2SLC6A4SLC6A3KIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112851710-A | 1-phospha norbornene chiral phosphine catalyst, and synthesis method and application thereof | 郑州大学 | 2021-05-28 | — | — | CN | claimed |
| EP-2980058-B1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| CN-112851710-B | 1-phospha norbornene chiral phosphine catalyst, and synthesis method and application thereof | 郑州大学 | 2022-08-23 | — | — | CN | disclosed |
| CN-112851710-B | 1-phospha norbornene chiral phosphine catalyst, and synthesis method and application thereof | 郑州大学 | 2022-08-23 | — | — | CN | disclosed |
| CN-112851710-A | 1-phospha norbornene chiral phosphine catalyst, and synthesis method and application thereof | 郑州大学 | 2021-05-28 | — | — | CN | disclosed |
| CN-112851710-A | 1-phospha norbornene chiral phosphine catalyst, and synthesis method and application thereof | 郑州大学 | 2021-05-28 | — | — | CN | disclosed |
| CN-106795366-B | Solidification compound and its solidfied material | 株式会社钟化 | 2019-05-07 | — | — | CN | disclosed |
| CN-108107676-A | Chemically amplified positive resist film laminated body and pattern formation method | 信越化学工业株式会社 | 2018-06-01 | — | — | CN | disclosed |
| US-9914687-B2 | Composition containing vinyl-group-containing compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-13 | — | — | US | disclosed |
| CN-103797418-B | A kind of negative light-sensitive resin combination, pattern formation method, cured film, dielectric film, colour filter and display device | 东京应化工业株式会社 | 2017-06-13 | — | — | CN | disclosed |
| EP-2264009-A1 | PYRIDYLAMINOACETIC ACID COMPOUND | Ube Industries, Ltd. (JP) | 2010-12-22 | — | — | EP | disclosed |
| EP-1788437-B1 | Rework process for photoresist film | SHINETSU CHEMICAL CO (JP) | 2009-12-23 | — | — | EP | disclosed |
| US-7476485-B2 | Resist lower layer film material and method for forming a pattern | SHIN-ESTU CHEMICAL CO., LTD. (JP) | 2009-01-13 | — | — | US | disclosed |
| EP-1788436-A1 | Rework process for photoresist film | Shin-Etsu Chemical Company, Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| EP-1788437-A2 | Rework process for photoresist film | Shinetsu Chemical Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| US-7214743-B2 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-20040259037-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |
| US-5612170-A | SILICONE, PHOTO ACID GENERATOR, DISSOLUTION INHIBITOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-03-18 | — | — | US | disclosed |