SCHEMBL533863

SCHEMBL533863

Sc1ncnn1-c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.41
ALDH1A1 P00352 8/20 0.40
KDM4E B2RXH2 4/20 0.40
TSHR P16473 3/20 0.40
KMT2A Q03164 3/20 0.40
MEN1 O00255 2/20 0.40
CYP1A2 P05177 2/20 0.40
CYP2C19 P33261 2/20 0.40
EGFR P00533 1/20 0.40
PI4KA P42356 1/20 0.40
PI4K2B Q8TCG2 1/20 0.40
HSD17B10 Q99714 1/20 0.40
PI4K2A Q9BTU6 1/20 0.40
PI4KB Q9UBF8 1/20 0.40
RIPK2 O43353 1/20 0.37
MAPT P10636 5/20 0.37
LMNA P02545 3/20 0.37
HTT P42858 3/20 0.37
GAA P10253 2/20 0.37
NPC1 O15118 6/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19086854 0.74 POLB (0.41) POLBALDH1A1KDM4ETSHRKMT2A
SCHEMBL11316957 0.74 POLB (0.50) POLBALDH1A1KDM4ETSHRKMT2A
SCHEMBL10166462 0.74 MAPK1 (0.41) POLBALDH1A1KDM4ETSHRKMT2A
SCHEMBL20280414 0.74 ALDH1A1 (0.43) POLBALDH1A1KDM4ETSHRKMT2A
SCHEMBL7045196 0.72 SMN1; SMN2 (0.43) POLBALDH1A1KDM4ETSHRKMT2A
SCHEMBL10775198 0.71 MAPT (0.49) ALDH1A1KDM4ETSHRKMT2AMEN1
SCHEMBL19551408 0.71 RIPK2 (0.50) POLBALDH1A1KDM4ETSHRKMT2A
SCHEMBL20033929 0.71 ALDH1A1 (0.45) POLBALDH1A1KDM4ETSHRKMT2A
SCHEMBL21863405 0.69 ALDH1A1 (0.46) POLBALDH1A1KDM4ETSHRKMT2A
SCHEMBL6057637 0.69 ALDH1A1 (0.47) ALDH1A1KDM4ETSHRKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1069211-A2 Electroplating solutions THE BOC GROUP, INC. (US) 2001-01-17 EP claimed
EP-3132932-B1 LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS PRESSTEK LLC (US) 2020-04-15 EP disclosed
US-20180117900-A1 EDGE TREATMENT FOR DEVELOP-ON-PRESS LITHOGRAPHIC PRINTING MEMBERS PRESSTEK, INC. 2018-05-03 US disclosed
EP-2906640-B1 COATING/SEALANT SYSTEMS, AQUEOUS RESINOUS DISPERSIONS, METHODS FOR MAKING AQUEOUS RESINOUS DISPERSIONS, AND METHODS OF ELECTROCOATING PRC DESOTO INT INC (US) 2017-11-15 EP disclosed
EP-2756043-B1 COATING/SEALANT SYSTEMS, AQUEOUS RESINOUS DISPERSIONS, AND METHODS OF ELECTROCOATING PRC DESOTO INT INC (US) 2017-04-12 EP disclosed
EP-3132932-A2 LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS Presstek, LLC. (US) 2017-02-22 EP disclosed
US-20170021656-A1 LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS PRESSTEK, LLC. 2017-01-26 US disclosed
EP-2033051-B1 NEGATIVE-WORKING IMAGEABLE ELEMENTS EASTMAN KODAK CO (US) 2016-11-30 EP disclosed
US-9347003-B2 Liquid crystal compound having tetrafluoropropenyl, liquid crystal composition, and liquid crystal display element JNC CORPORATION (JP) 2016-05-24 US disclosed
US-9181628-B2 Coating/sealant systems, aqueous resinous dispersions, and methods of electrocoating PRC-DESOTO INTERNATIONAL, INC. (US) 2015-11-10 US disclosed
US-7175949-B1 Radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY (US) 2007-02-13 US disclosed
US-7175969-B1 Method of preparing negative-working radiation-sensitive elements EASTMAN KODAK COMPANY (US) 2007-02-13 US disclosed
US-7153632-B1 Radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY (US) 2006-12-26 US disclosed
EP-1622768-A1 ON-PRESS DEVELOPABLE IR SENSITIVE PRINTING PLATES CONTAINING AN ONIUM SALT INITIATOR SYSTEM Kodak Polychrome Graphics LLC (US) 2006-02-08 EP disclosed
WO-2004101280-A1 ON-PRESS DEVELOPABLE IR SENSITIVE PRINTING PLATES CONTAINING AN ONIUM SALT INITIATOR SYSTEM KODAK POLYCHROME GRAPHICS LLC (US) 2004-11-25 WO disclosed
US-20040229165-A1 On-press developable IR sensitive printing plates containing an onium salt initiator system BANK OF AMERICA, N.A., AS AGENT 2004-11-18 US disclosed
US-20040187731-A1 Acid copper electroplating solutions WANG QING MIN (US) 2004-09-30 US disclosed
EP-1069211-A2 Electroplating solutions THE BOC GROUP, INC. (US) 2001-01-17 EP disclosed
US-5328803-A Alkali developable solutions with carboxy group binders and monomer with initiators FUJI PHOTO FILM CO., LTD. (JP) 1994-07-12 US disclosed
US-3932630-A Triazolyl phosphorus esters as pesticides CIBA-GEIGY CORPORATION (US) 1976-01-13 US disclosed