Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 5/20 | 0.61 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.61 |
| ▸ | TSHR | P16473 | 3/20 | 0.61 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.61 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.61 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
| ▸ | RAB9A | P51151 | 2/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | CHRM2 | P08172 | 4/20 | 0.49 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.49 |
| ▸ | HTR1A | P08908 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.49 |
| ▸ | DRD3 | P35462 | 1/20 | 0.49 |
| ▸ | SCN1A | P35498 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL388023 | 0.85 | SMN1; SMN2 (0.60) | LMNACYP1A2CYP3A4TSHRCYP2C19 | |
| SCHEMBL11596525 | 0.83 | SMN1; SMN2 (0.47) | LMNACYP1A2CYP3A4TSHRCYP2C19 | |
| SCHEMBL11597064 | 0.83 | SMN1; SMN2 (0.50) | LMNACYP1A2CYP3A4TSHRCYP2C19 | |
| SCHEMBL11054908 | 0.80 | ALDH1A1 (0.53) | LMNATSHRALDH1A1SMN1; SMN2KMT2A | |
| SCHEMBL10988158 | 0.80 | ALDH1A1 (0.47) | LMNACYP1A2CYP3A4TSHRCYP2C19 | |
| SCHEMBL28713490 | 0.80 | LMNA (0.56) | LMNACYP1A2CYP3A4TSHRCYP2C19 | |
| SCHEMBL11598292 | 0.79 | TSHR (0.46) | LMNACYP1A2CYP3A4TSHRALDH1A1 | |
| SCHEMBL11597975 | 0.79 | TSHR (0.46) | LMNACYP1A2CYP3A4TSHRALDH1A1 | |
| SCHEMBL13387443 | 0.77 | SMN1; SMN2 (0.50) | LMNACYP1A2CYP3A4TSHRCYP2C19 | |
| SCHEMBL22488793 | 0.77 | LMNA (0.60) | LMNACYP1A2CYP3A4TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2486452-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM Corporation (JP) | 2012-08-15 | — | — | EP | disclosed |
| EP-2414896-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM Corporation (JP) | 2012-02-08 | — | — | EP | disclosed |
| WO-2012002519-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | WO | disclosed |
| WO-2011162408-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | WO | disclosed |
| WO-2011043481-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-04-14 | — | — | WO | disclosed |
| WO-2010114107-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | WO | disclosed |
| EP-1641849-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | Symyx Technologies, Inc. (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1641848-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR Corporation (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2005003198-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORPORATION (JP) | 2005-01-13 | — | — | WO | disclosed |
| WO-2005000923-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | SYMYX TECHNOLOGIES, INC. (US) | 2005-01-06 | — | — | WO | disclosed |