SCHEMBL5343528

SCHEMBL5343528

COc1cc(OC)cc(C(=O)OCCN(CCOC(=O)c2cc(OC)cc(OC)c2)CCOC(=O)c2cc(OC)cc(OC)c2)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.61
▸ MEN1 O00255 3/20 0.61
▸ SMN1; SMN2 Q16637 1/20 0.61
▸ LMNA P02545 2/20 0.48
▸ SCN1A P35498 2/20 0.48
▸ SCN2A Q99250 2/20 0.48
▸ SCN3A Q9NY46 2/20 0.48
▸ TSHR P16473 4/20 0.46
▸ CYP2D6 P10635 2/20 0.46
▸ MAOA P21397 1/20 0.46
▸ HTR3A P46098 1/20 0.46
▸ HRH3 Q9Y5N1 1/20 0.46
▸ CYP3A4 P08684 1/20 0.46
▸ THPO P40225 1/20 0.46
▸ MTOR P42345 1/20 0.46
▸ NPSR1 Q6W5P4 2/20 0.45
▸ BLM P54132 1/20 0.45
▸ PKM P14618 1/20 0.45
▸ PMP22 Q01453 1/20 0.45
▸ MAPT P10636 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11236182 0.87 SERPINE1 (0.53) KMT2AMEN1SMN1; SMN2TSHRNPSR1
SCHEMBL501860 0.83 LMNA (0.63) KMT2AMEN1SMN1; SMN2LMNASCN1A
SCHEMBL8641536 0.82 KDM4E (0.55) KMT2AMEN1SMN1; SMN2LMNATSHR
SCHEMBL22660277 0.81 ESR1 (0.46) KMT2AMEN1SMN1; SMN2SCN1ASCN2A
SCHEMBL11679863 0.81 KMT2A (0.46) KMT2AMEN1SMN1; SMN2TSHRNPSR1
SCHEMBL14369822 0.81 SERPINE1 (0.47) KMT2AMEN1SMN1; SMN2TSHRNPSR1
SCHEMBL28583778 0.79 ESR1 (0.63) KMT2ASMN1; SMN2LMNATSHRCYP2D6
SCHEMBL3258075 0.78 MEN1 (0.64) KMT2AMEN1SMN1; SMN2LMNAMAOA
SCHEMBL22667933 0.78 SERPINE1 (0.46) KMT2AMEN1SMN1; SMN2SCN1ASCN2A
SCHEMBL18675963 0.78 HDAC6 (0.48) KMT2AMEN1SCN1ASCN2ASCN3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7276324-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-02 — — US disclosed
US-20050106500-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-19 — — US disclosed
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