⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16475536 | 0.77 | ALDH1A1 (0.36) | — | |
| SCHEMBL7746228 | 0.76 | — | — | |
| SCHEMBL20671031 | 0.76 | ALDH1A1 (0.39) | — | |
| SCHEMBL30818409 | 0.74 | TYR (0.35) | — | |
| SCHEMBL12227793 | 0.74 | LMNA (0.38) | — | |
| SCHEMBL13327624 | 0.73 | — | — | |
| SCHEMBL16904971 | 0.73 | — | — | |
| SCHEMBL6059815 | 0.73 | — | — | |
| SCHEMBL10688299 | 0.73 | ALDH1A1 (0.40) | — | |
| SCHEMBL10686103 | 0.73 | ALDH1A1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1693705-B1 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORP (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-7183423-B1 | Process for the preparation of organic compounds with imide catalysts | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2007-02-27 | — | — | US | disclosed |
| US-7163781-B2 | Process for producing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-16 | — | — | US | disclosed |
| US-6806335-B2 | FOR USE IN FINE PATTERNING OF SEMICONDUCTORS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-19 | — | — | US | disclosed |
| US-6692889-B1 | COPOLYMERS CONTAINING DERIVATIZED ADAMANTANYL ACRYLATE FUNCTIONALITY; ETCHING RESISTANCE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20040006189-A1 | Polymeric compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. | 2004-01-08 | — | — | US | disclosed |
| US-6552143-B2 | Addition polymer including units of 1-oxo-perhydro-5,6-didehydro-4,7-methanoisobenzofuran; making a semiconductor using the photoresist; high adhesion, fine patterns | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-04-22 | — | — | US | disclosed |
| US-20020169266-A1 | Polymeric compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-14 | — | — | US | disclosed |
| US-6440636-B1 | HIGH ETCHING RESISTANCE, TRANSPARENCY, ALKALI SOLUBILITY, AND ADHESION; ACRYLIC ESTERS HAVING ADAMANTANE GROUP | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-08-27 | — | — | US | disclosed |
| EP-1172384-A1 | POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| EP-1172694-A1 | POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| EP-1055654-A1 | PROCESS FOR THE PREPARATION OF ORGANIC COMPOUNDS WITH IMIDE CATALYSTS | Daicel Chemical Industries, Ltd. (JP) | 2000-11-29 | — | — | EP | disclosed |
| US-4968817-A | COBALT OR NICKEL CATALYST | NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) | 1990-11-06 | — | — | US | disclosed |