SCHEMBL5352718

SCHEMBL5352718

C=Cc1ccc(OCC(C)c2ccccc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.49
MTOR P42345 1/20 0.49
TP53 P04637 1/20 0.49
CYP3A4 P08684 1/20 0.49
CYP2D6 P10635 1/20 0.49
CYP2C9 P11712 1/20 0.49
MAPK1 P28482 1/20 0.49
CYP2C19 P33261 1/20 0.49
HSD17B10 Q99714 1/20 0.49
LMNA P02545 2/20 0.48
CHRNB2 P17787 2/20 0.48
CHRNA7 P36544 2/20 0.48
KDM4E B2RXH2 1/20 0.48
GMNN O75496 1/20 0.48
HPGD P15428 1/20 0.48
PMP22 Q01453 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
IGLV6-57 P01721 1/20 0.44
CHRNB4 P30926 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5200152 0.85 CA12 (0.53) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL21810947 0.82 LMNA (0.61) CYP2D6LMNAIGLV6-57TAAR1SCN4A
SCHEMBL408132 0.79 CHRNB2 (0.50) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL10399445 0.78 HIF1A (0.52) CYP2D6MAPK1CYP2C19LMNAHPGD
SCHEMBL9797252 0.78 LMNA (0.60) NPC1MTORTP53CYP3A4CYP2D6
Ammonia Solution, Strong SCHEMBL28712158 0.78 CHRNB2 (0.49) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL5693002 0.77 CHRNA7 (0.47) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL6287551 0.76 CHRNB2 (0.47) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL25339764 0.75 LMNA (0.52) CYP2C9LMNAKMT2ASCN4AALDH1A1
SCHEMBL1992997 0.75 CHRNB2 (0.50) NPC1MTORTP53CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed