SCHEMBL5353479

SCHEMBL5353479

C=C(C)c1ccc(OC(C)(C)CCCCC)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.36
TSHR P16473 1/20 0.36
HDAC3 O15379 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC2 Q92769 1/20 0.36
TNNC1 P63316 5/20 0.36
S1PR1 P21453 3/20 0.36
S1PR4 O95977 2/20 0.36
S1PR3 Q99500 2/20 0.36
S1PR5 Q9H228 2/20 0.36
SGPL1 O95470 1/20 0.36
GPR183 P32249 1/20 0.36
CERS2 Q96G23 1/20 0.36
PLA2G4B P0C869 1/20 0.36
PSEN1 P49768 2/20 0.35
PSEN2 P49810 2/20 0.35
APH1B Q8WW43 2/20 0.35
NCSTN Q92542 2/20 0.35
APH1A Q96BI3 2/20 0.35
PSENEN Q9NZ42 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5355453 0.98 TP53 (0.39) TP53TSHRTNNC1S1PR1S1PR4
SCHEMBL5356109 0.98 TP53 (0.39) TP53TSHRTNNC1S1PR1S1PR4
SCHEMBL5361978 0.95 HDAC3 (0.37) TP53TSHRHDAC3HDAC1HDAC2
SCHEMBL5367199 0.89 ELANE (0.41) TSHRHDAC3HDAC1HDAC2ELANE
SCHEMBL1997651 0.82 MAPT (0.34) TSHRHDAC3HDAC1HDAC2ELANE
SCHEMBL5495925 0.81 TP53 (0.58) TP53TSHRPLA2G4BMAPT
SCHEMBL6699152 0.79 HDAC3 (0.35) TP53TSHRHDAC3HDAC1HDAC2
SCHEMBL6689017 0.79 TP53 (0.41) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6693132 0.79 TP53 (0.38) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6693738 0.79 TP53 (0.38) TP53TSHRPLA2G4BPSEN1PSEN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed