SCHEMBL5361978

SCHEMBL5361978

C=C(C)c1ccc(OC(C)(C)CCCC)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 1/20 0.37
HDAC1 Q13547 1/20 0.37
HDAC2 Q92769 1/20 0.37
ELANE P08246 1/20 0.36
GAA P10253 1/20 0.34
RAB9A P51151 1/20 0.34
TP53 P04637 1/20 0.34
TSHR P16473 1/20 0.34
TNNC1 P63316 5/20 0.33
PSEN1 P49768 2/20 0.33
PSEN2 P49810 2/20 0.33
APH1B Q8WW43 2/20 0.33
NCSTN Q92542 2/20 0.33
APH1A Q96BI3 2/20 0.33
PSENEN Q9NZ42 2/20 0.33
S1PR4 O95977 2/20 0.33
S1PR1 P21453 2/20 0.33
S1PR3 Q99500 2/20 0.33
S1PR5 Q9H228 2/20 0.33
SGPL1 O95470 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5353479 0.95 TP53 (0.36) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL5355453 0.94 TP53 (0.39) GAARAB9ATP53TSHRTNNC1
SCHEMBL5356109 0.94 TP53 (0.39) GAARAB9ATP53TSHRTNNC1
SCHEMBL5367199 0.90 ELANE (0.41) HDAC3HDAC1HDAC2ELANETSHR
SCHEMBL6699152 0.83 HDAC3 (0.35) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL1997651 0.83 MAPT (0.34) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6699702 0.82 HDAC3 (0.34) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6689036 0.82 HDAC3 (0.34) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6697798 0.82 GAA (0.34) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6695731 0.81 HDAC3 (0.33) HDAC3HDAC1HDAC2ELANEGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed