SCHEMBL6699152

SCHEMBL6699152

C=C(C)c1ccc(OC(C)(CCCC)OC)cc1

nearest known ligand 0.35

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 2/20 0.35
HDAC1 Q13547 2/20 0.35
HDAC2 Q92769 2/20 0.35
ELANE P08246 1/20 0.33
GAA P10253 1/20 0.32
RAB9A P51151 1/20 0.32
TP53 P04637 1/20 0.32
TSHR P16473 1/20 0.32
MAPT P10636 1/20 0.32
PSEN1 P49768 2/20 0.32
PSEN2 P49810 2/20 0.32
APH1B Q8WW43 2/20 0.32
NCSTN Q92542 2/20 0.32
APH1A Q96BI3 2/20 0.32
PSENEN Q9NZ42 2/20 0.32
PLA2G4B P0C869 1/20 0.31
NR1I2 O75469 1/20 0.31
THRA P10827 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6691383 0.91 ELANE (0.38) HDAC3HDAC1HDAC2ELANEMAPT
SCHEMBL6689036 0.87 HDAC3 (0.34) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6699702 0.87 HDAC3 (0.34) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6697798 0.87 GAA (0.34) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6695731 0.86 HDAC3 (0.33) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6693132 0.85 TP53 (0.38) GAARAB9ATP53TSHRMAPT
SCHEMBL6693600 0.85 HDAC3 (0.33) HDAC3HDAC1HDAC2ELANEGAA
SCHEMBL6693605 0.84 MAPT (0.35) ELANETSHRMAPTNR1I2
SCHEMBL6691008 0.83 TP53 (0.40) GAARAB9ATP53TSHRMAPT
SCHEMBL5361978 0.83 HDAC3 (0.37) HDAC3HDAC1HDAC2ELANEGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed