Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | MMP14 | P50281 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5360193 | 0.92 | ELANE (0.35) | CYP2D6CYP2C19ALDH1A1ATML3MBTL1 | |
| SCHEMBL5357706 | 0.88 | CYP2D6 (0.38) | CYP2D6CYP2C19ALDH1A1 | |
| SCHEMBL5347779 | 0.80 | CYP2D6 (0.34) | CYP2D6CYP2C19 | |
| SCHEMBL6744508 | 0.79 | CYP2D6 (0.38) | CYP2D6CYP2C19ALDH1A1 | |
| SCHEMBL31695291 | 0.79 | CYP2D6 (0.40) | CYP2D6CYP2C19MEN1KMT2A | |
| SCHEMBL5348568 | 0.79 | CYP2D6 (0.35) | CYP2D6CYP2C19MMP2MMP9MMP14 | |
| SCHEMBL7863152 | 0.77 | CYP2D6 (0.36) | CYP2D6CYP2C19 | |
| SCHEMBL201163 | 0.77 | CYP2D6 (0.38) | CYP2D6CYP2C19ALDH1A1 | |
| SCHEMBL31695324 | 0.76 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL7211020 | 0.75 | CYP2D6 (0.39) | CYP2D6CYP2C19MEN1ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| EP-1085379-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |