SCHEMBL201163

SCHEMBL201163

CCCOC(=O)C1(C)CC2C=CC1C2

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.38
CYP2C19 P33261 1/20 0.38
P2RX7 Q99572 1/20 0.36
CETP P11597 1/20 0.32
ALDH1A1 P00352 2/20 0.30
EPHX2 P34913 1/20 0.30
TMIGD3 P0DMS9 1/20 0.30
HTR2C P28335 1/20 0.30
TSPO P30536 1/20 0.30
ADORA1 P30542 1/20 0.30
HTR2B P41595 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL200578 0.91 CYP2C19 (0.36) CYP2D6CYP2C19P2RX7CETPALDH1A1
SCHEMBL32689139 0.90 EPHX2 (0.38) CYP2D6CYP2C19P2RX7ALDH1A1EPHX2
SCHEMBL21593923 0.88 P2RX7 (0.36) CYP2D6CYP2C19P2RX7CETPALDH1A1
SCHEMBL14628487 0.88 P2RX7 (0.36) CYP2D6CYP2C19P2RX7CETPALDH1A1
SCHEMBL4253408 0.88 P2RX7 (0.36) CYP2D6CYP2C19P2RX7CETPALDH1A1
SCHEMBL200228 0.88 CYP2C19 (0.40) CYP2D6CYP2C19P2RX7CETP
SCHEMBL5186809 0.85 P2RX7 (0.34) CYP2D6CYP2C19P2RX7CETP
SCHEMBL7211020 0.83 CYP2D6 (0.39) CYP2D6CYP2C19ALDH1A1EPHX2NPSR1
SCHEMBL25428359 0.82 CYP2D6 (0.36) CYP2D6CYP2C19P2RX7CETPTMIGD3
SCHEMBL294664 0.81 P2RX7 (0.34) CYP2D6CYP2C19P2RX7CETP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260078079-A1 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES OSMO LABS PBC (US) 2026-03-19 US disclosed
CN-110366704-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社(JP) 2023-01-13 CN disclosed
CN-108885398-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社 2022-11-29 CN disclosed
CN-114402258-A Radiation-sensitive resin composition 日本瑞翁株式会社 2022-04-26 CN disclosed
US-11169440-B2 Radiation-sensitive resin composition and electronic component ZEON CORPORATION (JP) 2021-11-09 US disclosed
EP-3345970-B1 RESIN COMPOSITION ZEON CORP (JP) 2021-07-28 EP disclosed
EP-3434731-B1 RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE ZEON CORP (JP) 2021-06-09 EP disclosed
CN-108779317-B Resin composition, resin film, and electronic component 日本瑞翁株式会社 2021-04-16 CN disclosed
CN-107922742-B Resin composition 日本瑞翁株式会社 2021-01-15 CN disclosed
CN-107207868-B Resin composition, resin film, and electronic component 日本瑞翁株式会社 2020-11-06 CN disclosed
CN-1290275-A Catalyst and process for polymerization of cycloolefin GOODRICH CO B F (US) 2001-04-04 CN disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
US-6180316-B1 SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS JSR CORPORATION (JP) 2001-01-30 US disclosed
EP-1048983-A1 Radiation sensitive resin composition JSR Corporation (JP) 2000-11-02 EP disclosed
EP-1034196-A1 CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS THE B.F. GOODRICH COMPANY (US) 2000-09-13 EP disclosed
US-6103445-A POLYMER OF A T-BUTYL ESTER OF NORBORNENE CARBOXYLIC ACID ANALOG, A PHOTOACID GENERATOR, AND PLASTICIZER COMPRISING A DI-TERT-BUTYL ESTER OF A POLYCYCLIC DICARBOXYLIC ACID; TRANSPARENCY AT 193 NM AND AN ETCH RESISTANCE; RESOLUTION BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 2000-08-15 US disclosed
WO-2000020472-A1 CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS THE B.F. GOODRICH COMPANY (US) 2000-04-13 WO disclosed
EP-0930541-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-07-21 EP disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed
EP-0789278-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-08-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260078079-A1 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES CBR1, CBR3, TAS2R1 CYP2D6 650/4885CYP2C19 1533/4885P2RX7 239/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.